Chemical Formula: AlLi
Catalog Number: ST0482
CAS Number: 87871-87-2
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The Aluminum-Lithium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality sputtering targets at the most competitive prices.
Aluminum lithium sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Al and Li. Due to its low density, high specific modulus and excellent fatigue and low-temperature toughness characteristics, the Aluminum-Lithium sputter target has become an advanced material in aerospace technology.
|Material Type||Aluminum Lithium|
|Melting Point||718 °C|
|Available Sizes||Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Aluminum-Lithium Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our Aluminum-Lithium Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s Aluminum Lithium Sputtering Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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Individually boxed and shipped nicely. Will buy from SAM again if needed.