Catalog No.: ST334
Material: 90% In2O3+10% SnO2 / 95% In2O3+5% SnO2
CAS Number: 50926-11-9
Indium Bonding and Elastomeric Target Bonding Service are available for Iindium Tin Oxide Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
|Material Type||Indium Tin Oxide|
|Symbol||In2O3/SnO2 90/10 wt %|
|Color/Appearance||Pale yellow to greenish yellow|
|Type of Bond||Indium, Elastomer|
|Indium Tin Oxide, ITO||2.0″ Dia. x 0.125″ Thick|
|Indium Tin Oxide, ITO||2.0″ Dia. x 0.250″ Thick|
|Indium Tin Oxide, ITO||3.0″ Dia. x 0.125″ Thick|
|Indium Tin Oxide, ITO||3.0″ Dia. x 0.250″ Thick|
|Indium Tin Oxide, ITO||4.0″ Dia. x 0.125″ Thick|
|Indium Tin Oxide, ITO||4.0″ Dia. x 0.250″ Thick|
|Indium Tin Oxide, ITO||5.0″ Dia. x 0.125″ Thick|
|Indium Tin Oxide, ITO||5.0″ Dia. x 0.250″ Thick|
|Indium Tin Oxide, ITO||6.0″ Dia. x 0.125″ Thick|
|Indium Tin Oxide, ITO||6.0″ Dia. x 0.250″ Thick|
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
Indium tin oxide (ITO) is a solid solution of indium oxide (In2O3) and tin oxide (SnO2), typically 90% In2O3, 10% SnO2 by weight. Indium tin oxide (ITO) is one of the most widely used transparent conducting oxides because of its electrical conductivity and optical transparency. Thin films of indium tin oxide are most commonly deposited on surfaces by physical vapor deposition (PVD).
Deposited by magnetron or other sputtering techniques, Indium Tin Oxide (ITO) target is used for the ITO coated substrates including electrodes for flat panel displays, touch panel contacts, energy saving automobile and building window glass, optoelectronic devices, solar panels, etc. Stanford Advanced Materials provide high-quality ITO targets with different dimensions to our customers.
Our indium tin oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
SAM specializes in producing high purity indium tin oxide sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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Exactly as advertised. Worked great for my ITO film coating.