Catalog No.: ST0334
Material: Indium Tin Oxide, ITO
CAS Number: 50926-11-9
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
ITO sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality ITO sputter targets at the most competitive price.
ITO sputtering target from Stanford Advanced Materials is a ceramic sputtering material made of indium tin oxide. Indium tin oxide (ITO) is a solid solution of indium oxide (In2O3) and tin oxide (SnO2), typically 90% In2O3, 10% SnO2 by weight. Indium tin oxide (ITO) is one of the most widely used transparent conducting oxides because of its electrical conductivity and optical transparency. Thin films of indium tin oxide are most commonly deposited on surfaces by physical vapor deposition (PVD).
|Material Type||Indium Tin Oxide|
|Color/Appearance||Pale yellow to greenish yellow|
|Type of Bond||Indium, Elastomer|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, and you can send us an inquiry for more information.
ITO sputter target is used for the ITO coated substrates including electrodes for flat panel displays, touch panel contacts, energy-saving automobile and building window glass coating, optoelectronic devices, solar cells, etc. Stanford Advanced Materials provide high purity and high density ITO targets with different dimensions to our customers.
Indium Bonding and Elastomeric Target Bonding Service are available for indium tin oxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our indium tin oxide sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
SAM’s ITO sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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Exactly as advertised. Worked great for my ITO film coating.