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Home / Sputtering Target / By Chemical Elements / S

Sb2S3

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Antimony Sulfide (Sb2S3) Sputtering Target

BaS

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Barium Sulfide (BaS) Sputtering Target

Bi2S3

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Bismuth Sulfide (Bi2S3) Sputtering Target

Cadmium Sulfide

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Cadmium Sulfide (CdS) Sputtering Target

CaS

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Calcium Sulfide (CaS) Sputtering Target

Cr2S3

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Chromium Sulfide (Cr2S3) Sputtering Target

CuS

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Copper Sulfide (CuS) Sputtering Target

GeS

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Germanium Sulfide (GeS) Sputtering Target

In2S3

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Indium Sulfide (In2S3) Sputtering Target

FeS

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Iron Sulfide (FeS) Sputtering Target

PbS

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Lead Sulfide (PbS) Sputtering Target

MgS

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Magnesium Sulfide (MgS) Sputtering Target

MnS

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Manganese Sulfide (MnS) Sputtering Target

MoS2

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Molybdenum Disulfide (MoS2) Sputtering Target

SiS2

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Silicon Sulfide (SiS2) Sputtering Target

TaS2

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Tantalum Sulfide (TaS2) Sputtering Target

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Rotatory Molybdenum (Mo) Sputtering Target
Rotatory Copper (Cu) Sputtering Target
Planar Copper (Cu) Sputtering Target
Planar Molybdenum (Mo) Sputtering Target
Iron Aluminum (Fe/Al) Evaporation Materials

SPUTTERTARGETS

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. It was first established in 1994 to begin supplying high-quality rare-earth products to assist our customers in the research and development (R&D) fields.

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Recent Posts

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Everything you need to know about ITO sputtering target
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Everything you need to know about titanium sputtering target
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