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Home / Sputtering Target / By Chemical Elements / S

Sb2S3

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Antimony Sulfide (Sb2S3) Sputtering Target

BaS

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Barium Sulfide (BaS) Sputtering Target

Bi2S3

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Bismuth Sulfide (Bi2S3) Sputtering Target

Cadmium Sulfide

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Cadmium Sulfide (CdS) Sputtering Target

CaS

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Calcium Sulfide (CaS) Sputtering Target

Cr2S3

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Chromium Sulfide (Cr2S3) Sputtering Target

CuS

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Copper Sulfide (CuS) Sputtering Target

GeS

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Germanium Sulfide (GeS) Sputtering Target

In2S3

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Indium Sulfide (In2S3) Sputtering Target

FeS

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Iron Sulfide (FeS) Sputtering Target

PbS

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Lead Sulfide (PbS) Sputtering Target

MgS

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Magnesium Sulfide (MgS) Sputtering Target

MnS

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Manganese Sulfide (MnS) Sputtering Target

MoS2

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Molybdenum Disulfide (MoS2) Sputtering Target

SiS2

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Silicon Sulfide (SiS2) Sputtering Target

TaS2

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Tantalum Sulfide (TaS2) Sputtering Target

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Iron Aluminum (Fe/Al) Evaporation Materials

SPUTTERTARGETS

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. It was first established in 1994 to begin supplying high-quality rare-earth products to assist our customers in the research and development (R&D) fields.

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Recent Posts

Common Targets And Corresponding Color
Applications of High-purity Titanium Target Materials
Merits and Demerits of Different Thin Film Solar Cell Target Materials
What are the uses of Molybdenum Sputtering Targets?
The Market Capacity and Development Trend of High-Purity Sputtering Target Industry

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