Chemical Formula: SnS2
Catalog Number: ST0479
CAS Number: 1315-01-1
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Tin(IV) Sulfide Sputter Targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
Tin (IV) Sulfide Sputtering Target is composed of tin and sulfur. High-purity Tin (IV) Sulfide sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
|Material Type||Tin (IV) Sulfide|
|Color/Appearance||Dark Brown Solid|
|Melting Point||882 °C|
|Available Sizes||Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Tin (IV) Sulfide Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our Tin (IV) Sulfide Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s Tin(IV) Sulfide Sputter Targets are available in various forms, purities, sizes, and prices. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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What a great purchase! This pack should last me a long time! Recommended!