Chemical Formula: ZnS
Catalog Number: ST0289
CAS Number: 1314-98-3
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
The zinc sulfide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality zinc sulfide sputter targets at the most competitive prices.
Zinc sulfide sputtering target is a type of sulfide ceramic sputtering target composed of zinc and sulfur.
Zinc is a chemical element originated from the German, ‘zinc’, which may in turn be derived from the Persian word ‘sing’, meaning stone. It was early used before 1000 BC and discovered by Indian metallurgists. “Zn” is the canonical chemical symbol of zinc. Its atomic number in the periodic table of elements is 30 with location at Period 4 and Group 12, belonging to the d-block. The relative atomic mass of zinc is 65.409(4) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Zinc (Zn) Sputtering Target
Sulfur, also called sulphur, is a chemical element originated from Either from the Sanskrit ‘sulvere’, or the Latin ‘sulfurium’, both names for sulfur. It was early used before 2000 BC and discovered by Chinese and Indians. “S” is the canonical chemical symbol of sulfur. Its atomic number in the periodic table of elements is 16 with location at Period 3 and Group 16, belonging to the p-block. The relative atomic mass of sulfur is 32.065(5) Dalton, the number in the brackets indicating the uncertainty.
|Appearance||White, Crystalline Solid|
|Melting Point||1,700 °C|
|Bonding Method||Indium, Elastomer|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Indium Bonding and Elastomer Bonding are recommended for the ZnS zinc sulfide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
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It is a high purity Sputtering Target.