ST0931 Yttrium Aluminum Oxide Sputtering Target, Y3Al5O12, YAG

Yttrium Aluminum Oxide Sputtering Target Description

Yttrium Aluminum Oxide Sputtering Target is a material used in the sputtering process for depositing thin films onto substrates. Yttrium aluminum oxide is a compound composed of yttrium (Y), aluminum (Al), and oxygen (O) ions. In the sputtering process, high-energy ions are directed at the yttrium aluminum oxide sputtering target, causing atoms or molecules to be ejected from the target surface. These ejected particles then deposit onto a substrate, forming a thin film with properties inherited from the yttrium aluminum oxide material.

Sputtering targets come in different shapes and sizes based on the requirements of the thin film deposition process and the sputtering equipment used. The choice of a yttrium aluminum oxide sputtering target depends on the desired properties of the thin film and its intended applications.

Related Product: Yttrium Oxide Sputtering Target

Yttrium Aluminum Oxide Sputtering Target Specifications

Yttrium Aluminum Oxide Sputtering Target Handling Notes

1. Indium bonding is recommended for the Yttrium Aluminum Oxide Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
2. This material has a low thermal conductivity and is susceptible to thermal shock.

Yttrium Aluminum Oxide Sputtering Target Application

• Optical Coatings: Yttrium aluminum oxide thin films can be used in optical coatings, such as anti-reflective coatings, beam splitters, and laser coatings.
• Laser Technology: Yttrium aluminum oxide is commonly used in the production of laser crystals, especially for neodymium-doped yttrium aluminum garnet (Nd:YAG) lasers.
• Scintillators: Yttrium aluminum oxide can be employed in the production of scintillators used in medical imaging devices and other applications.
• Semiconductor Manufacturing: Yttrium aluminum oxide coatings may find applications in the semiconductor industry, particularly in the fabrication of certain electronic and optoelectronic devices.

Yttrium Aluminum Oxide Sputtering Target Packaging

Our Yttrium Aluminum Oxide Sputtering Target is widely used in the production of coatings for various purposes, such as improving the wear resistance of tools, enhancing the durability of surfaces, or providing specific optical or electrical properties.

Get Contact

SAM’s Yttrium Aluminum Oxide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.