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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0143 Copper Oxide Sputtering Target, CuO

Chemical Formula: CuO
Catalog Number: ST0143
CAS Number: 1317-39-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The copper oxide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality copper oxide sputter targets at the most competitive prices.

Copper Oxide MSDS File




Description

Copper Oxide Sputtering Target Description

Copper-II-oxideCopper oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula CuO. It is a black solid, and it is one of the two stable oxides of copper, the other being Cu2O or copper (I) oxide (cuprous oxide).

Copper is a chemical element that originated from the Old English name coper in turn derived from the Latin ‘Cyprium aes’, meaning a metal from Cyprus. It was early used in 9000 BC and discovered by people from the Middle East. “Cu” is the canonical chemical symbol of copper. Its atomic number in the periodic table of elements is 29 with a location at Period 4 and Group 11, belonging to the d-block. The relative atomic mass of copper is 63.546(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Copper (Cu) Sputtering Target

Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Copper Oxide Sputtering Target Specification

Material Type Copper (II) Oxide
Symbol CuO
Color/Appearance Black Solid
Melting Point 1,201° C
Density 6.31 g/cm3
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Copper Oxide Sputtering Target Handling Notes

1. Indium Bonding is recommended for copper oxide CuO sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.

2. This material has a low thermal conductivity are susceptible to thermal shock.

Copper Oxide Sputtering Target Application

The copper oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Copper Oxide Sputtering Target Packing

Our copper oxide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High-quality copper oxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Copper Oxide Sputtering Target, CuO
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