(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0313 Tantalum Selenide Sputtering Target, TaSe2

Chemical Formula: TaSe2
Catalog Number: ST0313
CAS Number: 12039-55-3
Purity: >99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The tantalum selenide sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality niobium selenide sputter targets at the most competitive prices.

Tantalum Selenide MSDS File




Description

Tantalum Selenide Sputtering Target Description

Tantalum selenide sputtering target is a type of selenide ceramic sputtering target composed of tantalum and selenium.

TantalumTantalum is a chemical element originated from King Tantalus, father of Niobe from Greek mythology. It was first mentioned in 1802 and observed by G. Ekeberg. “Ta” is the canonical chemical symbol of tantalum. Its atomic number in the periodic table of elements is 73 with location at Period 6 and Group 5, belonging to the d-block. The relative atomic mass of tantalum is 180.94788(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Tantalum Sputtering Target

SeleniumSelenium is a chemical element originated from Moon (with the Greek name selene). It was first mentioned in 1817 and observed by J. Berzelius and G. Gahn. The isolation was later accomplished and announced by J. Berzelius and G. Gahn. “Se” is the canonical chemical symbol of selenium. Its atomic number in the periodic table of elements is 34 with location at Period 4 and Group 16, belonging to the p-block. The relative atomic mass of selenium is 78.96(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Selenium Sputtering Target

Tantalum Selenide Sputtering Target Specification

Compound Formula TaSe2
CAS No. 12039-55-3
Apperance Solid
Density 6.7 g/cm3
Melting Point 2000 °C
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Tantalum Selenide Sputtering Target Application

The tantalum selenide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Tantalum Selenide Sputtering Target Packing

Our tantalum selenide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s tantalum selenide sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for the current prices of sputtering targets and other deposition materials that are not listed.

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Tantalum Selenide Sputtering Target, TaSe2
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