(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0048 Tantalum Sputtering Target, Ta

Chemical Formula:Ta
Catalog Number: ST0048
CAS Number: 7440-25-7
Purity: 99.95%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Tantalum sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is a trusted sputtering target supplier working with international partners to bring you the highest quality products with the most affordable pricing. 

Tantalum Sputtering Target Safety Data Sheet



Tantalum Sputtering Target Description

Tantalum sputtering target is used in integrated circuits and Thin Film Transistor Liquid Crystal Display (TFT-LCD). SAM specializes in producing high-purity Sputtering Targets with the highest possible density and smallest possible average grain sizes.

Tantalum is a rare, hard, blue-gray, lustrous transition metal that is highly corrosion-resistant. It is part of the refractory metals group, which are widely used as minor components in alloys. The chemical inertness of tantalum makes it a valuable substance for laboratory equipment and a substitute for platinum.

Tantalum Sputtering Target Specification

Material Type Tantalum
Symbol Ta
Color/Appearance Gray Blue, Metallic
Thermal Conductivity 57 W/m.K
Melting Point 3,017°C
Coefficient of Thermal Expansion 6.3 x 10-6/K
Sputter DC
Type of Bond Indium, Elastomer
Comments Forms good films
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Tantalum Sputtering Target Application

High-performance tantalum sputtering materials are used for thin film coating applications, CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industries, glass coating industries like car glass and architectural glass, optical communication, etc.


About half the tantalum consumed each year is used within the electronics industry, mainly as powder and wire for capacitors. The tantalum capacitor is favored in space-sensitive, high-end applications in telecommunications, data storage, and implantable medical devices.


Using the physical vapor deposition (PVD) process, the tantalum sputter target is “sputtered” onto semiconductor substrates to form a thin film diffusion barrier to protect the copper interconnects. Tantalum sputtering targets are used in a variety of other products, including magnetic storage media, inkjet printer heads, and flat panel displays.

Engine turbine blades

The metal’s high melting point and resistance to corrosion make it suitable for alloying applications. Tantalum is used in nickel-based superalloys where the principal applications are turbine blades for aircraft engines and land-based gas turbines.

Chemical processing equipment

Tantalum’s high resistance to corrosion and high temperature makes the metal an ideal material for the construction of liners in vessels, piping, valves, and heat exchangers in the chemical and pharmaceutical industries.

Tantalum Sputtering Target Target Bonding

Indium Bonding and Elastomeric Target Bonding Services are available for Ta Sputtering Targets. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods, and services, please click here.

Target Bonding Services

Tantalum Sputtering Target Packaging

Our tantalum sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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High-purity tantalum sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high-purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

Related Article:

Application of Tantalum Target in Thermal Inkjet Print Head and Copper Plating

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Tantalum (Ta) Sputtering Target
Average rating:  
 2 reviews
by Larry Thomson on Tantalum (Ta) Sputtering Target

It's a second purchase. As good as usual.

by John A. on Tantalum (Ta) Sputtering Target

As advertised in the picture. Looks a little smalled than the picture, but is a bar of tantalum which is what I need and I don't care how it looks, so perfectly satisfied and price seemed good.