All for Joomla All for Webmasters
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0048 Tantalum (Ta) Sputtering Target

Chemical Formula:Ta
Catalog Number: ST0048
CAS Number: 7440-25-7
Purity: 99.95%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Tantalum – Safety Data Sheet



Tantalum Sputtering Target Description

Tantalum sputtering target is used in integrated circuits and Thin Film Transistor Liquid Crystal Display (TFT-LCD). SAM specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes.

Tantalum is a rare, hard, blue-gray, lustrous transition metal that is highly corrosion-resistant. It is part of the refractory metals group, which are widely used as minor components in alloys. The chemical inertness of tantalum makes it a valuable substance for laboratory equipment and a substitute for platinum.

Tantalum Sputtering Target Specification

Material Type Tantalum
Symbol Ta
Color/Appearance Gray Blue, Metallic
Thermal Conductivity 57 W/m.K
Melting Point 3,017°C
Coefficient of Thermal Expansion 6.3 x 10-6/K
Sputter DC
Type of Bond Indium, Elastomer
Comments Forms good films
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Tantalum Sputtering Target Application

About half the tantalum consumed each year is used within the electronics industry, mainly as powder and wire for capacitors. The tantalum capacitor is favored in space-sensitive, high-end applications in telecommunications, data storage and implantable medical devices.
Using the physical vapor deposition (PVD) process, the tantalum sputter target is “sputtered” onto semiconductor substrates to form a thin film diffusion barrier to protect the copper interconnects. Tantalum sputtering targets are used in a variety of other products, including magnetic storage media, inkjet printer heads and flat panel displays.
Engine turbine blades
The metal’s high melting point and resistance to corrosion makes it suitable for alloying applications. Tantalum is used in nickel based superalloys where the principal applications are turbine blades for aircraft engines and land based gas turbines.
Chemical processing equipment
Tantalum’s high resistance to corrosion and high temperature makes the metal an ideal material of construction for liners in vessels, piping, valves and heat exchangers in the chemical and pharmaceutical industries.

Target Bonding of Tantalum Sputtering Target

Indium Bonding and Elastomeric Target Bonding Service are available for Ta Sputtering Targets. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Target Bonding Services


Our tantalum sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

Please send us an inquiry for current pricing on tantalum sputtering targets and other thin film deposition materials not listed.

Submit your review

Create your own review

Tantalum (Ta) Sputtering Target
Average rating:  
 2 reviews
by Larry Thomson on Tantalum (Ta) Sputtering Target

It's a second purchase. As good as usual.

by John A. on Tantalum (Ta) Sputtering Target
so perfectly satisfied and price seemed good

As advertised in the picture. Looks a little smalled than the picture, but is a bar of tantalum which is what I need and I don't care how it looks, so perfectly satisfied and price seemed good.