Catalog Number: ST0048
CAS Number: 7440-25-7
Purity: 99.95%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Tantalum sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is a trusted sputtering target supplier working with international partners to bring you the highest quality products with the most affordable pricing.
Tantalum sputtering target is used in integrated circuits and Thin Film Transistor Liquid Crystal Display (TFT-LCD). SAM specializes in producing high purity Sputtering Targets with the highest possible density and smallest possible average grain sizes.
Tantalum is a rare, hard, blue-gray, lustrous transition metal that is highly corrosion-resistant. It is part of the refractory metals group, which are widely used as minor components in alloys. The chemical inertness of tantalum makes it a valuable substance for laboratory equipment and a substitute for platinum.
|Color/Appearance||Gray Blue, Metallic|
|Thermal Conductivity||57 W/m.K|
|Coefficient of Thermal Expansion||6.3 x 10-6/K|
|Type of Bond||Indium, Elastomer|
|Comments||Forms good films|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
High performance tantalum sputtering materials are used for thin film coating applications, CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
About half the tantalum consumed each year is used within the electronics industry, mainly as powder and wire for capacitors. The tantalum capacitor is favored in space-sensitive, high-end applications in telecommunications, data storage and implantable medical devices.
Using the physical vapor deposition (PVD) process, the tantalum sputter target is “sputtered” onto semiconductor substrates to form a thin film diffusion barrier to protect the copper interconnects. Tantalum sputtering targets are used in a variety of other products, including magnetic storage media, inkjet printer heads and flat panel displays.
Engine turbine blades
The metal’s high melting point and resistance to corrosion makes it suitable for alloying applications. Tantalum is used in nickel based superalloys where the principal applications are turbine blades for aircraft engines and land based gas turbines.
Chemical processing equipment
Tantalum’s high resistance to corrosion and high temperature makes the metal an ideal material of construction for liners in vessels, piping, valves and heat exchangers in the chemical and pharmaceutical industries.
Indium Bonding and Elastomeric Target Bonding Service are available for Ta Sputtering Targets. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our tantalum sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
High purity tantalum sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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It's a second purchase. As good as usual.
As advertised in the picture. Looks a little smalled than the picture, but is a bar of tantalum which is what I need and I don't care how it looks, so perfectly satisfied and price seemed good.