| Chemical Formula | As2Se3 |
| Catalog No. | ST0935 |
| CAS Number | 1303-36-2 |
| Purity | 99.9%, 99.95%, 99.99%, 99.995%, 99.999% |
| Shape | Discs, Plates, Column Targets, Step Targets, Custom-made |
Arsenic Triselenide Sputtering Target is made of high-purity arsenic triselenide, which can be used for semiconductors, optics, and photovoltaics. Sputtering technology deposits ultra-high purity metals or oxides onto a solid substrate to form uniform, dense, ultra-thin films.
The distinctive structure of arsenic selenide imparts unique optical characteristics, including specific absorption and transmission properties within the infrared spectral range, as well as non-linear optical properties. Furthermore, it showcases distinct attributes in terms of thermoelectric and electrical properties.
Related Product: Arsenic Trisulfide Sputtering Target
| Compound Formula | As2Se3 |
| Molecular Weight | 386.72 |
| Appearance | Black Target |
| Melting Point | 300℃ |
| Density | 4.75 g/cm3 |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″ |
Arsenic Triselenide Sputtering Targets exhibit distinctive properties in the realms of optics and photovoltaics, rendering them the optimal material for such applications. Furthermore, these targets find extensive utilization in display technology through chemical vapor deposition (CVD) and physical vapor deposition (PVD). Choose the high-purity, high-quality Arsenic Triselenide Sputtering Targets provided by Stanford Advanced Materials (SAM) for superior performance in your research and applications within related fields.
Our Arsenic Triselenide Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.
SAM’s Arsenic Triselenide Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
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