Stanford Advanced Materials (SAM) offers a comprehensive portfolio of high-purity Platinum Sputtering Targets, including pure platinum and various platinum alloy targets. Our targets are engineered to deliver exceptional performance in thin-film deposition processes such as DC magnetron sputtering, ensuring superior film uniformity, excellent adhesion, and maximum process efficiency for a wide range of high-tech applications.
Our platinum target collection includes both pure platinum and platinum alloy variants, each designed to meet specific performance requirements in thin-film deposition processes.
Pure Platinum Targets
Available in 99.95%, 99.99%, and 99.999% purity levels, our pure platinum targets provide excellent electrical conductivity, corrosion resistance, and catalytic properties. These targets are ideal for applications requiring high-purity platinum films without alloying elements.
Platinum Alloy Targets
We manufacture various platinum alloy targets to achieve specific material characteristics:
Semiconductor Manufacturing: For creating interconnects, barrier layers, and electrodes in memory chips and logic devices.
Can’t Find Your Specific Platinum Alloy?
Many less-common platinum alloys are not listed on our website. We specialize in custom-manufacturing sputtering targets to your exact specifications. Contact our experts today to discuss your unique material requirements.