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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST1001 Platinum Iridium Sputtering Target, Pt-Ir

Chemical Formula Pt-Ir
Catalog No. ST1001
CAS Number
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) proudly introduces Platinum Iridium Sputtering Targets, known for exceptional purity. Leveraging materials science expertise, we provide tailored solutions and competitive pricing, meeting precise requirements in nanotechnology and thin-film deposition.


Platinum Iridium Sputtering Target Description

Platinum Iridium Sputtering Target is a material used in the sputtering deposition process. Sputtering is a widely used technique in thin film deposition, where atoms or ions are ejected from a solid target material and deposited onto a substrate to form a thin film.

Platinum Iridium Sputtering Target features excellent corrosion resistance, high melting point, and good electrical conductivity. The alloy is often used in applications that require high-temperature stability, such as thermocouples, electrical contacts, and biomedical devices.

Related Product: Lead Platinum Sputtering Target, Platinum Ruthenium Sputtering Target

Platinum Iridium Sputtering Target Specifications

Compound Formula Pt-Ir
Molecular Weight 387.3
Appearance Silver Metallic Target
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Platinum Iridium Sputtering Target Handling Notes

  1. Indium bonding is recommended for the Platinum Iridium Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Platinum Iridium Sputtering Target Application

  1. Electronic Manufacturing: Platinum Iridium Sputtering Targets are crucial in electronic manufacturing, contributing to the creation of high-performance electronic devices due to their exceptional purity and unique material composition.
  2. Advanced Materials Engineering: These targets find significance in advanced materials engineering, where their distinctive properties make them valuable in the development of innovative materials with enhanced characteristics.
  3. Nanotechnology Applications: Platinum Iridium Sputtering Targets play a crucial role in nanotechnology applications, showcasing adaptability and contributing to advancements in cutting-edge technologies.
  4. Thin-Film Deposition: Instrumental in thin-film deposition processes, these targets ensure precise and uniform coatings, serving various industrial and research applications.

Platinum Iridium Sputtering Target Packaging

Our Platinum Iridium Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Platinum Iridium Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapour deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapour deposition (CVD), and physical vapour deposition (PVD) display and optical applications.