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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0952 Platinum Manganese Sputtering Target, PtMn

Chemical Formula PtMn
Catalog No. ST0952
CAS Number 12339-83-2
Purity 99.9%, 99.95%, 99.99%, 99.995%, 99.999%
Shape Discs, Plates, Column Targets, Step Targets, Custom-made

Stanford Advanced Materials (SAM) stands out as a premier provider delivering Platinum Manganese Sputtering Targets. Our commitment extends beyond excellence in purity, encompassing dedication to offering competitive pricing, making Stanford Advanced Materials (SAM) the preferred choice for your advanced material needs


Platinum Manganese Sputtering Target Description

Platinum Manganese Sputtering Targets supplied by Stanford Advanced Materials (SAM) ensure precise chemical composition with nominal purity and are a key factor in the thin film preparation process. The surface properties of Platinum Manganese Sputtering Targets and the performance of the preparation process are directly related to the quality and uniformity of the film. The preparation properties of the target are critical for the control of the thin film deposition process. The Platinum Manganese Sputtering Target has magnetic properties and may play a key role in applications such as magnetic films and magnetic storage. It also has good electrical conductivity, allowing the preparation of conductive films as well as some electronic devices. In addition, its thermal stability allows it to perform well even at certain high temperatures.

Related Product: Platinum Sputtering Target, Lead Platinum Sputtering Target

Platinum Manganese Sputtering Target Specifications

Compound Formula PtMn
Molecular Weight 250.02
Appearance Silver Target
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″

Thick: 0.125″, 0.250″

Platinum Manganese Sputtering Target Handling Notes

  1. Indium bonding is recommended for Platinum Manganese Sputtering Target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.
  2. This material has a low thermal conductivity and is susceptible to thermal shock.

Platinum Manganese Sputtering Target Application

Platinum Manganese Sputtering Target finds diverse applications in the realm of thin film deposition, embellishment, semiconductor technology, display manufacturing, LED production, and the development of photovoltaic devices. Additionally, it serves in the creation of functional coatings and contributes to various aspects of the optical data storage industry. This versatile target also plays a pivotal role in the glass coating sector, particularly in applications such as automotive glass and architectural glass. Moreover, it is employed in optical communication technologies and extends its utility to an array of industries. The widespread use of Platinum Manganese Sputtering Target underscores its significance across multiple fields, making it an integral component in the advancement of various technologies and industrial processes.

Platinum Manganese Sputtering Target Packaging

Our Platinum Manganese Sputtering Target is carefully handled during storage and transportation to preserve the quality of our products in their original condition.

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SAM’s Platinum Manganese Sputtering Target is available in various forms, purities, and sizes. We specialize in producing high-purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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