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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0205 Zinc Oxide with Gallium Oxide (ZnO/Ga2O3) Sputtering Target

Chemical Formula: ZnO/Ga2O3
Catalog Number: ST0205
CAS Number: 1314-13-2 | 1202
Purity: 99.9%, 99.95%, 99.99%
Shape:Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Available Sizes of Zinc Oxide doped with Gallium Oxide Sputtering Target

Material Size
Zinc Oxide doped with Gallium Oxide, ZnO/Ga2O3 2.00″ Dia. x 0.125″ Thick
Zinc Oxide doped with Gallium Oxide, ZnO/Ga2O3 2.00″ Dia. x 0.250″ Thick
Zinc Oxide doped with Gallium Oxide, ZnO/Ga2O3 3.00″ Dia. x 0.125″ Thick
Zinc Oxide doped with Gallium Oxide, ZnO/Ga2O3 4.00″ Dia. x 0.250″ Thick

Description of Zinc Oxide doped with Gallium Oxide Sputtering Target

Zinc

ZincZinc is a chemical element originated from the German, ‘zinc’, which may in turn be derived from the Persian word ‘sing’, meaning stone. It was early used before 1000 BC and discovered by Indian metallurgists. “Zn” is the canonical chemical symbol of zinc. Its atomic number in the periodic table of elements is 30 with location at Period 4 and Group 12, belonging to the d-block. The relative atomic mass of zinc is 65.409(4) Dalton, the number in the brackets indicating the uncertainty.

Gallium

GalliumGallium is a chemical element originated from France (with the Latin name Gallia). It was first mentioned in 1875 and observed by P. E. L. de Boisbaudran. The isolation was later accomplished and announced by P. E. L. de Boisbaudran. “Ga” is the canonical chemical symbol of gallium. Its atomic number in the periodic table of elements is 31 with location at Period 4 and Group 13, belonging to the p-block. The relative atomic mass of gallium is 69.723(1) Dalton, the number in the brackets indicating the uncertainty.

Packaging of Zinc Oxide with Gallium Oxide Sputtering Target

Our Zinc Oxide with Gallium Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high purity Zinc Oxide with Gallium Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

 

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Zinc Oxide with Gallium Oxide (ZnO/Ga2O3) Sputtering Target
Average rating:  
 1 reviews
by Frank D. Scott Jr. on Zinc Oxide with Gallium Oxide (ZnO/Ga2O3) Sputtering Target

Love the look and the way they are packed.