Chemical Formula: Er2O3
Catalog Number: ST0146
CAS Number: 12061-16-4
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) provides the best erbium oxide sputtering target on the market with a competitive price and great delivery time. Customized forms are available upon request.
Erbium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula Er2O3.
Erbium is a chemical element that originated from Ytterby, Sweden. It was first mentioned in 1842 and observed by G. Mosander. “Er” is the canonical chemical symbol of erbium. Its atomic number in the periodic table of elements is 68 with a location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of erbium is 167.259(3) Dalton, the number in the brackets indicating the uncertainty.
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Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
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1. Indium bonding is recommended for Er2O3 sputtering material, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc. 2. This material has a low thermal conductivity are susceptible to thermal shock.
The erbium oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our erbium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity erbium oxide sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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