Chemical Formula: Ce2.2Bi0.8Fe5O12
Catalog Number: ST0432
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Cerium bismuth ferrite sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
Cerium bismuth ferrite sputtering target is composed of bismuth, calcium, iron, and oxide with the chemical formula of Ce2.2Bi0.8Fe5O12. High-purity cerium bismuth ferrite sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Cerium Sputtering Target, Bismuth Sputtering Target, Iron Sputtering Target
| Material Type | Cerium bismuth ferrite |
| Symbol | Ce2.2Bi0.8Fe5O12 |
| Color/Appearance | Solid |
| Melting Point | N/A |
| Density | N/A |
| Type of Bond | Elastomer, Indium |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Our cerium bismuth ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high-purity cerium bismuth ferrite sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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These work great. I've only used them to sputter a thin film. They are a great price too.
