Chemical Formula: Bi1.5Lu1.5Fe4GaO12
Catalog Number: ST0430
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Bismuth lutetium iron gallate sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
Bismuth lutetium iron gallate is a sputtering target with the chemical formula of Bi1.5Lu1.5Fe4GaO12. High-purity bismuth lutetium iron gallate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Bismuth Sputtering Target, Lutetium Sputtering Target, Iron Sputtering Target
| Material Type | Bismuth lutetium iron gallate |
| Symbol | Bi1.5Lu1.5Fe4GaO12 |
| Color/Appearance | Solid |
| Melting Point | N/A |
| Density | N/A |
| Type of Bond | Elastomer, Indium |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Our bismuth lutetium iron gallate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high-purity bismuth lutetium iron gallate sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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Wow! What a great purchase! This pack should last me a long time! Recommended!
One person found this helpful
Great deal for the price! When I run out, I will be buying more. Great quality, just like the picture.
