ST0430 Bismuth Lutetium Iron Gallate Sputtering Target

Description of Bismuth Lutetium Iron Gallate Sputtering Target

Bismuth

Bismuth is a chemical element originated from the German ‘Bisemutum’ a corruption of ‘Weisse Masse’ meaning white mass. It was early used in 1753 and discovered by C.F. Geoffroy. “Bi” is the canonical chemical symbol of bismuth. Its atomic number in the periodic table of elements is 83 with location at Period 6 and Group 15, belonging to the p-block. The relative atomic mass of bismuth is 208.98040(1) Dalton, the number in the brackets indicating the uncertainty.

Lutetium

Lutetium is a chemical element originated from Paris, France (with the Roman name Lutetia). It was first mentioned in 1906 and observed by G. Urbain and C.A. von Welsbach. The isolation was later accomplished and announced by G. Urbain and C.A. von Welsbach. “Lu” is the canonical chemical symbol of lutetium. Its atomic number in the periodic table of elements is 71 with location at Period 6 and Group 3, belonging to the d-block. The relative atomic mass of lutetium is 174.967(1) Dalton, the number in the brackets indicating the uncertainty.

Iron

Iron, also called ferrum, is a chemical element originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

Gallium

Gallium is a chemical element originated from France (with the Latin name Gallia). It was first mentioned in 1875 and observed by P. E. L. de Boisbaudran. The isolation was later accomplished and announced by P. E. L. de Boisbaudran. “Ga” is the canonical chemical symbol of gallium. Its atomic number in the periodic table of elements is 31 with location at Period 4 and Group 13, belonging to the p-block. The relative atomic mass of gallium is 69.723(1) Dalton, the number in the brackets indicating the uncertainty.

Packaging of Bismuth Lutetium Iron Gallate Sputtering Target

Our Bismuth Lutetium Iron Gallate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high purity Bismuth Lutetium Iron Gallate Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.