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advantages-and-disadvantages-of-ion-beam-sputtering

Advantages and Disadvantages of Ion Beam Sputtering

Ion Beam Sputtering Definition Ion beam sputtering (IBS), or ion beam deposition (IBD), is a thin film deposition technology that uses an ion source to deposit a sputtering target onto a substrate to produce the highest quality films with excellent precision. Compared to other PVD technologies, ion beam sputtering is more accurate and can accurately control...
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Graphite Crucibles Used for Metal Smelting

Introduction Crucibles are widely used in metallurgy, chemical processing, and a variety of industries. Among these crucibles, graphite crucibles are useful for the smelting of non-ferrous metals and alloys with their desirable properties. Let’s have a detailed discussion about the features, competitiveness, and uses of graphite crucibles. Hope that you can have a better understanding...
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Tantalum Capacitors

The Key Role of Tantalum Targets in Semiconductor Manufacturing

When we think about semiconductor manufacturing, we often picture highly advanced technologies, intricate processes, and an army of materials working in the background. Among these materials, tantalum (Ta) sputtering targets play a surprisingly crucial role. But why exactly is this unassuming metal so important for semiconductor devices? Let’s dive in. What Makes Tantalum So Special...
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Ti alloy targets

Metal, Ceramic, or Alloy: Choosing the Right Sputtering Target

When it comes to thin film deposition, the choice of sputtering target material can make or break the performance of your final product. For procurement specialists and product managers working in materials science, semiconductors, optics, or advanced coatings, understanding the distinctions between metal, ceramic, and alloy targets is critical. This article breaks down the characteristics,...
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Rotary Metal Targets in Semiconductor Sputtering

Ever wondered what makes semiconductor devices work like magic? Well, the answer lies in the thin films that coat them, and one of these processes is the rotary metal target. These cylindrical, rotating forms of metal (like tantalum, niobium, and molybdenum) are used in sputtering, a key process in semiconductor manufacturing. If you’re involved in purchasing...
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thin film coating

CVD Growth of Multilayer hBN Films on Copper Foils

Introduction Hexagonal boron nitride (hBN) is an extremely hot research area within materials and nanotechnology. It possesses remarkable thermal stability, electrical insulation property, and high thermal conductivity, thereby making this material most suitable for various applications in electronic devices, energy storage, and optoelectronic systems. Chemical vapor deposition (CVD) technology is simple, economical and environmentally friendly. It...
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