Introduction Thin film deposition is an integral part of semiconductor chip production. Sputtering is perhaps the most established and reliable method of placing smooth films on wafers. Among all the materials that have been employed as targets, niobium stands out for its unique combination of electrical, thermal, and chemical properties that qualify it perfectly for...Continue Reading

The sputtering target materials commonly found on the market can be divided into planar targets and rotatory targets according to their shapes. Want to know what are their advantages and disadvantages? Keep on reading this post. Planar Sputtering Target Although rotary targets have developed in recent years, the mainstream shape of the sputtering target is still the planar type. Advantages...Continue Reading

Sputtering target is the key material for vacuum magnetron sputtering (PVD) coating. Working principle of target material: The target material is used as the cathode in the PVD system. The free electrons produced by the vacuum system impact the Ar molecule and form the Ar+ cation under the acceleration of the electric field, and the...Continue Reading

Titanium targets are widely used in decorative coatings, wear-resistant coatings, electronic industries such as CD, VCD, and all kinds of magnetic disk coating. Tungsten titanium (W-Ti) films and tungsten titanium (W-Ti) based alloy films are high-temperature alloy films, which possess a series of irreplaceable good properties. Tungsten has the high melting point, high strength, and...Continue Reading

A vacuum evaporation film, in an environment of no less than 10-2Pa vacuum, which is heated by resistance heating or electron beam and laser bombardment to heat the evaporated material to a fixed temperature so that the thermal vibration energy of the molecules or atoms in the material exceeds the binding energy of the surface,...Continue Reading