(949) 407-8904 Mon - Fri 08:00 - 17:00 1940 East Deere Avenue, Suite 100, Santa Ana, CA 92705, USA

Blogs

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. We update every week about news and knowledge of sputtering targets and evaporation materials. Here are the blogs we published previously.

ITO vs. AZO

The Clock is Ticking on ITO. Is AZO Finally the Answer?

Here’s a fact that keeps display execs up at night: Your entire transparent electrode supply chain hinges on a metal you don’t actually buy. Indium is a byproduct of zinc mining—its supply is tied to construction demand, not your panel forecasts. When a factory manager told me his “indium price risk” budget now exceeds his maintenance...

Cost Reduction Path for Large-Size OLED Electrodes: ITO Optimization, Silver Alloys & New TCOs

Abstract: As OLED displays scale to larger formats, the cost of the transparent electrode becomes a critical bottleneck. This article maps the practical engineering strategies for cost reduction across three material fronts: pushing incumbent ITO to its efficiency limits, integrating novel silver alloy anodes, and evaluating the readiness of next-generation TCO alternatives. We provide a decision...

An Overview of Magnetron Sputtering

An Overview of Magnetron Sputtering Magnetron sputtering, a physical vapor deposition (PVD) process, is a main thin film deposition method for manufacturing semiconductors, disk drives, CDs, and optical devices. Magnetron sputtering has the advantages of high speed, low temperature, and low damage. In this article, let’s take a look at the definition, working principle, and...
optimize-target-tco

Semiconductor Target TCO Analysis: Boosting Utilization by 30% via Design & Bonding

Abstract: In semiconductor manufacturing, the cost of a PVD sputtering target extends far beyond its purchase price. For 300mm targets, low utilization rates and unscheduled downtime due to bonding failures represent massive, hidden costs. This article provides a Total Cost of Ownership framework, demonstrating how strategic target design (rotary vs. planar, asymmetric erosion profiles) and advanced...
Platinum vs. Gold Ring

Should You Choose Platinum or Gold for Your Wedding Ring in 2026?

Back in 2019, we published a guide comparing platinum and gold rings. It quickly became one of our most-read articles, helping readers make informed choices about their wedding jewelry. But times have changed — and so have the reasons behind choosing one metal over the other. If you’re shopping in 2026, here’s what actually matters....
3D-NAND-COVER

PVD Targets for DRAM & 3D NAND Manufacturing: From Capacitor Electrodes to Step Coverage

Abstract: The divergence in memory architecture between DRAM and 3D NAND Flash presents unique thin-film deposition challenges, directly impacting cost and performance. This article dissects the critical PVD target strategies for both technologies: the pursuit of seamless, high-aspect-ratio fill for DRAM capacitors, and the battle for conformal step coverage in 3D NAND’s towering staircases. We...
3nm 2nm chips

Key PVD Target Guide for 3nm/2nm Nodes: Selecting Cobalt & Ruthenium Barrier Layers

As the semiconductor industry advances beyond the 5nm node, conventional barrier/liner materials, such as Ta/TaN, are approaching their physical limits. This article provides a technical point of view of the two most promising successors: Cobalt (Co) and Ruthenium (Ru) PVD targets. We compare their material properties, process integration challenges, and selection criteria for advanced FinFET and...

What is Chemical Vapor Deposition (CVD)? The Ultimate Guide

Introduction Chemical Vapor Deposition (CVD) might sound like an obscure lab technique, but it’s the invisible engine behind modern technology. It’s what makes your smartphone processor faster, your new sunglasses more scratch-resistant, and a jet engine withstand infernal temperatures. In essence, CVD is the art of turning a gas into a perfect solid coating, and...

Case Study: Ensuring Optimal Performance of IGZO Sputtering Targets through Expert Preconditioning Guidance

Client: A leading thin-film deposition research facility Challenge: Uncertainty in preconditioning and operating a non-conductive IGZO sputtering target on a specific indirect-cooled cathode system. Solution: Stanford Advanced Materials provided detailed, system-aware technical guidance, bridging material science and equipment engineering. Result: Enabled the client to establish a safe, effective, and stable deposition process, preventing target damage and ensuring consistent film...
1 2 3 32