Blog | Stanford Advanced Materials

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. We update every week about news and knowledge of sputtering targets and evaporation materials. Here are the blogs we published previously.

August 28, 2025Applications, Blog

Titanium Sputtering Targets: Shapes and Applications

Titanium is a widely used material in thin film technology due to its high strength, corrosion resistance, and compatibility with a broad range of substrates. In sputtering, titanium targets are applied to deposit thin metallic films directly, or to form compound films such as titanium nitride (TiN) and titanium dioxide (TiO₂). These coatings are valued...

August 19, 2025Blog, Sputtering Target

Copper Sputter Targets: Shapes and Applications

Copper sputter targets are used to deposit thin metal films on various substrates. They are chosen for their electrical and thermal conductivity, ductility, and adhesion properties. Thin films from copper appear in electronics, solar cells, displays, and decorative coatings. The shape and size of the target influence deposition uniformity and material usage. Target Shapes Planar...

August 6, 2025Blog, Comparison, Guides & How-to

Should You Choose Platinum or Gold for Your Wedding Ring in 2025?

Back in 2019, we published a guide comparing platinum and gold rings. It quickly became one of our most-read articles, helping readers make informed choices about their wedding jewelry. But times have changed — and so have the reasons behind choosing one metal over the other. If you’re shopping in 2025, here’s what actually matters....

July 31, 2025Blog, Semiconductors, Sputtering Target

Zirconium Sputtering Targets in Semiconductor Chip Manufacturing

Introduction The semiconductor industry is driving the technological revolution, fueling the progress of electronics, computing, and communications. As performance demands rise and chip dimensions continue to be reduced, the material employed for their manufacture must conform to increasingly stringent specifications. High-purity zirconium sputtering targets have become a flagship material for the industry, making it possible to form high-quality metal oxide thin films, gate material, as well as metal interconnect layers. This article...

July 24, 2025Applications, Blog, Sputtering Target

Case Study: Improving ITO Target Performance in Mobile and Tablet Display Manufacturing

Introduction One of SAM’s long-term clients—a major display panel manufacturer—was experiencing frequent production disruptions. The culprit: cracking and uneven wear in their ITO sputtering targets, used in the thin-film deposition process for smartphone and tablet displays. After reviewing the setup, SAM proposed switching to denser, more uniform ITO targets. That small change led to significant...

July 17, 2025Blog, Metal, Semiconductors, Sputtering Target

Chromium Sputtering Targets’ Value in Semiconductor Manufacturing

Introduction The semiconductor industry is the backbone of modern-day technology, powering everything from smart phones to artificially intelligent computers. As device sizes shrink and performance requirements expand, materials used in the semiconductor production process must be subjected to more demanding needs. High-purity Cr sputtering targets are now the focal material of this technology enabling high-toughness...

July 10, 2025Blog, Semiconductors, Sputtering Target

High-Purity Vanadium Sputtering Targets in Semiconductor Applications

In the semiconductor industry, the demand for smaller, faster, and lower power devices has created a growing demand for advanced materials. High-purity vanadium (V) sputtering targets have also been found to be an essential material in overcoming some of the key challenges in chip manufacturing. With distinguishing features such as excellent conductivity, heat resistance, and...

July 3, 2025Blog, Semiconductors, Sputtering Target

Tantalum Sputtering Targets in Semiconductor Manufacturing

The insatiable requirement for thinner, faster, and power-saving technologies has made the semiconductor industry one of the prime drivers of technological advancement. Behind the drive is a critical material: high-purity tantalum (Ta) sputtering targets. The targets are a critical ingredient in enabling next-generation semiconductor manufacturing processes, solving dire issues to chip reliability and performance. Tantalum...

1 2 3 … 34

Blogs