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Blogs

Stanford Advanced Materials (SAM) Corporation is a global supplier of various sputtering targets such as metals, alloys, oxides, ceramic materials. We update every week about news and knowledge of sputtering targets and evaporation materials. Here are the blogs we published previously.

An Overview of Magnesium Oxide Sputtering Targets

An Overview of Magnesium Oxide (MgO) Sputtering Targets

In the high-tech era of thin-film deposition, not all materials are equal. Although gold and silver metals are celebrated for their conductivity, emerging ceramics like Magnesium Oxide (MgO) are the quiet workers that enable the next generation of technology. Magnesium Oxide sputtering targets are the raw materials of this technology, providing the source material to...
Automotive manufacturing

6 Crucial Aluminum Uses in Daily Life (And Why It’s Everywhere)

Aluminum is everywhere. Cars, foil, power lines, window frames — you name it. It’s lightweight, tough, and incredibly versatile. It makes up around 8% of the Earth’s crust, which makes it the most abundant metal out there. Pretty impressive for a material we barely notice, right? Even more impressive is that it’s 100% recyclable, making it...
PVD VS. CVD

Table Comparison: Physical Vapor Deposition Vs. Chemical Vapor Deposition

1. The Core Difference at a Glance Before diving deep, here is the fundamental distinction: PVD (Physical Vapor Deposition): A physical process. A solid material is vaporized in a vacuum and then condenses as a thin film on the substrate. Think of it as transferring material atom-by-atom. CVD (Chemical Vapor Deposition): A chemical process. Gaseous precursors react or decompose on the...
Main Methods of PVD Coating

PVD Coating Methods: A 2025 Guide to Types and Selection

Introduction Physical Vapor Deposition (PVD) is a cornerstone of modern manufacturing, but with multiple methods available, choosing the right one is critical. This guide doesn’t just list the PVD coating types—it provides a clear framework for comparing and selecting the ideal process based on your material, application, and budget. Quick Navigation: Comparative Analysis Table In-Depth Method Breakdown...
High-Entropy Alloy (HEA) Sputtering Target

Processing Methods for Preparing High Entropy Alloy Sputtering Targets

Introduction High entropy alloy sputtering targets are becoming popular due to their impressive properties and wide-ranging uses in modern industry. There are two main approaches to creating these targets. One involves a special smelting process, while the other makes use of powder metallurgy. Over many years, these methods have been refined to meet the demands...
Anti-Reflective Coatings

Applications of Zinc Oxide Sputtering Targets in Glass Coatings

Zinc Oxide (ZnO) sputtering targets are a key material utilized during the deposition process known as magnetron sputtering. In the process, high-energy ions strike the target and eject zinc oxide atoms. The ejected atoms deposit themselves on substrates such as glass, forming a thin yet strong film. These Zinc Oxide films have been greatly helpful...

Everything You Need to Know About Sputtering Targets

1. Introduction to Sputtering Targets Sputtering targets are significant commodities for thin-film industries like electronics, optics, and energy sectors. Simply put, a “sputtering target” is the target material utilized for sputtering, a form of physical vapor deposition (PVD). During the PVD process, atoms from a solid target are removed and ejected upon impact by high-energy...
Silicon Wafer

Comparing Magnesium and Magnesium Oxide Targets for Thin Film Deposition on Silicon

Magnesium vs. Magnesium Oxide Targets – Which One Gets Better Film on Silicon? High-quality thin films play a big role in electronic and optical devices. Over the years, the choice of sputtering target has been shown to significantly influence film properties. When depositing magnesium oxide films on silicon, the selected target—either pure magnesium or magnesium...
Titanium Sputtering Targets: Shapes and Applications

Titanium Sputtering Targets: Shapes and Applications

Titanium is a widely used material in thin film technology due to its high strength, corrosion resistance, and compatibility with a broad range of substrates. In sputtering, titanium targets are applied to deposit thin metallic films directly, or to form compound films such as titanium nitride (TiN) and titanium dioxide (TiO₂). These coatings are valued...
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