(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0507 Silicon Aluminum Sputtering Target, Si/Al

Chemical Formula: Si/Al
Catalog Number: ST0507
Purity: 99%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

At SAM, we provide a range of Silicon Aluminum Sputter Targets in different forms, purities, sizes, and prices. Our expertise lies in producing high-purity physical vapor deposition materials, optimized for use in semiconductor, chemical vapor deposition, and physical vapor deposition applications in displays and optics. If you require further information or have specific inquiries, feel free to contact us.




Description

Silicon Aluminum Sputtering Target Description

Silicon

Silicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.

AluminumAluminum, or Aluminium, is a silvery-white, soft, non-magnetic and ductile metal in the boron group. Aluminum metal is highly reactive, such that native specimens are rare and limited to extreme reducing environments. Instead, it is found combined in over 270 different minerals.When evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. It is widely used in the aerospace, automotive lighting, OLED, and optical industries.

Related Products: Silicon Sputtering TargetAluminum Sputtering Target.

Silicon Aluminum Sputtering Target Specifications

Material Type Silicon Aluminum
Symbol Si/Al
Color/Appearance Metallic solid in various forms including powder, sputtering target, foil, bar, plate
Melting Point /
Density /
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Silicon Aluminum Sputtering Target Application

Silicon Aluminum Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Silicon Aluminum Sputtering Target Packing

Our Silicon Aluminum Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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Silicon Aluminum Sputtering Target, Si/Al
Average rating:  
 1 reviews
by Gregg Wright on Silicon Aluminum Sputtering Target, Si/Al

Good quality and doesn't break with a crash.