(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0496 Germanium Silicon Sputtering Target, Ge/Si

Chemical Formula: Ge/Si
Catalog Number: ST0496
Purity: 99%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

At SAM, we provide a range of Germanium Silicon Sputter Targets in different forms, purities, sizes, and prices. Our expertise lies in producing high-purity physical vapor deposition materials, optimized for use in semiconductor, chemical vapor deposition, and physical vapor deposition applications in displays and optics. If you require further information or have specific inquiries, feel free to contact us.




Description

Germanium Silicon Sputtering Target Description

GermaniumGermanium is a chemical element originated from Germany (with the Latin name Germania). Like silicon, germanium is a semiconductor and frequently utilized in the fabrication of transistors and integrated circuits. It is often evaporated under vacuum to create layers in the production of optical storage media and optical coatings. Other uses of the material are as an alloying agent and catalyst.

SiliconSilicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.

Related Products: Germanium Sputtering TargetSilicon Sputtering Target.

Germanium Silicon Sputtering Target Specifications

Material Type Germanium Silicon
Symbol Ge/Si
Color/Appearance Metallic solid in various forms including powder, sputtering target, foil, bar, plate
Melting Point /
Density /
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Germanium Silicon Sputtering Target Application

Germanium Silicon Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packing

Our Germanium Silicon Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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Germanium Silicon Sputtering Target, Ge/Si
Average rating:  
 1 reviews
by Tim Niceley on Germanium Silicon Sputtering Target, Ge/Si

Great stuff. Strong. Well crafted. Great looking and nice quality.