Titanium is a widely used material in thin film technology due to its high strength, corrosion resistance, and compatibility with a broad range of substrates. In sputtering, titanium targets are applied to deposit thin metallic films directly, or to form compound films such as titanium nitride (TiN) and titanium dioxide (TiO₂). These coatings are valued...Continue Reading

Copper sputter targets are used to deposit thin metal films on various substrates. They are chosen for their electrical and thermal conductivity, ductility, and adhesion properties. Thin films from copper appear in electronics, solar cells, displays, and decorative coatings. The shape and size of the target influence deposition uniformity and material usage. Target Shapes Planar...Continue Reading

Introduction Thin film deposition is an integral part of semiconductor chip production. Sputtering is perhaps the most established and reliable method of placing smooth films on wafers. Among all the materials that have been employed as targets, niobium stands out for its unique combination of electrical, thermal, and chemical properties that qualify it perfectly for...Continue Reading

Back in 2019, we published a guide comparing platinum and gold rings. It quickly became one of our most-read articles, helping readers make informed choices about their wedding jewelry. But times have changed — and so have the reasons behind choosing one metal over the other. If you’re shopping in 2025, here’s what actually matters....Continue Reading