(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

What should I do before I use the ceramic sputtering target?

  1. Attempting to ignite a plasma at low power may require a high argon gas pressure.
  2. Power to the target should be ramped up slowly through the break-in period.
  3. Since the deposition rate increases as the power density increases, the natural tendency is to use high power to speed up the deposition.
  4. When the deposition run is complete, it is equally important to ramp-down power at the same rate as the ramp-up, allowing the target to cool slowly to avoid thermal shock and the potential for target fracture.
About the author

Julissa Green graduated from the University of Texas studying applied chemistry. She started her journalism life as a chemistry specialist in Stanford Advanced Materials (SAM) since 2016 and she has been fascinated by this fast growing industry ever since. If you have any particular topics of interest, or you have any questions, you can reach her at julissa@samaterials.com.

Leave a Reply