(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0495 Iron Aluminum Silicon (Fe/Al/Si) Sputtering Target

Chemical Formula: Fe/Al/Si
Catalog Number: ST0495
Purity: 99%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Description of Iron Aluminum Silicon Sputtering Target

ironIron, also called ferrum, is a chemical element originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

AluminumAluminum, or Aluminium, is a silvery-white, soft, non-magnetic and ductile metal. Aluminum metal is highly reactive, such that native specimens are rare and limited to extreme reducing environments. Instead, it is found combined in over 270 different minerals.When evaporated in a vacuum, aluminum layers form a reflective coating found on telescopes, automotive headlamps, mirrors, packages, and toys. It is widely used in the aerospace, automotive lighting, OLED, and optical industries.

Silicon

Silicon is a chemical element originated from the Latin ‘silex’ or ‘silicis’, meaning flint. It was first mentioned in 1824 and observed by J. Berzelius. The isolation was later accomplished and announced by J. Berzelius. “Si” is the canonical chemical symbol of silicon. Its atomic number in the periodic table of elements is 14 with location at Period 3 and Group 14, belonging to the p-block. The relative atomic mass of silicon is 28.0855(3) Dalton, the number in the brackets indicating the uncertainty.

Related Products: Iron sputtering targetAluminumsputtering targetSilicon sputtering target.

Specifications of Iron Aluminum Silicon Sputtering Target

Material Type Iron Aluminum Silicon
Symbol Fe/Al/Si
Color/Appearance Metallic solid in various forms including powder, sputtering target, foil, bar, plate
Melting Point /
Density /
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Packing

Our Iron Aluminum Silicon sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s Iron Aluminum Silicon sputter targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

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Iron Aluminum Silicon (Fe/Al/Si) Sputtering Target
Average rating:  
 1 reviews
by Dina Tyson on Iron Aluminum Silicon (Fe/Al/Si) Sputtering Target

Quality product, work well. Five stars