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Client: A leading thin-film deposition research facility Challenge: Uncertainty in preconditioning and operating a non-conductive IGZO sputtering target on a specific indirect-cooled cathode system. Solution: Stanford Advanced Materials provided detailed, system-aware technical guidance, bridging material science and equipment engineering. Result: Enabled the client to establish a safe, effective, and stable deposition process, preventing target damage and ensuring consistent film...Continue Reading

Introduction When we work with ceramic sputtering targets, we often start with a basic powdered material that is later transformed into a dense, strong component through a process known as sintering. In hot pressing, heat and pressure work together to consolidate powders without changing their inherent chemical characteristics. Many approaches are applied in industrial settings...Continue Reading

Introduction Tantalum sputtering targets have been an important material in many industrial processes. They are small chips of tantalum produced under pressure, known for their high chemical purity, fine grain structure, and consistent crystalline quality. These targets are major players in film deposition for optical fibers, semiconductor chips, and integrated circuits. They are also used...Continue Reading