(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0474 Titanium Silicate Sputtering Target, Ti0.44Si0.10O

Chemical Formula: Ti0.44Si0.10O
Catalog Number: ST0474
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Titanium Silicate Sputtering Targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.




Description

Titanium Silicate Sputtering Target Description

Titanium Silicate Sputtering Target is composed of titanium, silicon, and oxygen. High-purity titanium silicate sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Titanium Sputtering TargetSilicon Sputtering TargetOxide Ceramic Sputtering Target

Titanium Silicate Sputtering Target Specification

Material Type Titanium Silicate
Symbol Ti0.44Si0.10O
Color/Appearance Solid
Melting Point /
Density /
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Titanium Silicate Sputtering Target Application

Titanium Silicate Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Titanium Silicate Sputtering Target Packaging

Our Titanium Silicate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

We specialize in producing high purity Titanium Silicate Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Titanium Silicate Sputtering Target, Ti0.44Si0.10O
Average rating:  
 1 reviews
by Marlene Mahlum on Titanium Silicate Sputtering Target, Ti0.44Si0.10O

Good quality lab materials!