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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0473 Titanium Ferrite (TiFe2O4) Sputtering Target

Chemical Formula: TiFe2O4
Catalog Number: ST0473
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Target Bonding of Titanium Ferrite Sputtering Target

Target Bonding Service is available for Nickel Ferrite Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.

Available Sizes of Titanium Ferrite Sputtering Target

Material Size
Nickel Ferrite, NiFe2O4 2.00″ Dia. x 0.250″ Thick
Nickel Ferrite, NiFe2O4 2.00″ Dia. x 0.125″ Thick

Description of Titanium Ferrite Sputtering Target

Titanium

TitaniumTitanium is a chemical element originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius. “Ti” is the canonical chemical symbol of titanium. Its atomic number in the periodic table of elements is 22 with location at Period 4 and Group 4, belonging to the d-block. The relative atomic mass of titanium is 47.867(1) Dalton, the number in the brackets indicating the uncertainty.

Iron

ironIron, also called ferrum, is a chemical element originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

Packaging of Titanium Ferrite Sputtering Target

Our Titanium Ferrite Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high purity Titanium Ferrite Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

 

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Titanium Ferrite (TiFe2O4) Sputtering Target
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