(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0473 Titanium Ferrite Sputtering Target, TiFe2O4

Chemical Formula: TiFe2O4
Catalog Number: ST0473
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Titanium Ferrite Sputtering Targets are available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.




Description

Titanium Ferrite Sputtering Target Description

Titanium Ferrite Sputtering Target is composed of titanium, iron, and oxygen. High-purity titanium ferrite sputter targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.

Related products: Titanium Sputtering TargetIron Sputtering TargetOxide Ceramic Sputtering Target

Titanium Ferrite Sputtering Target Specification

Material Type Titanium Ferrite
Symbol TiFe2O4
Color/Appearance Solid
Melting Point /
Density 7.35 g/cm3
Type of Bond Elastomer, Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Other sizes are also available. Please contact us for customized sputtering targets.

Titanium Ferrite Sputtering Target Application

Titanium Ferrite Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Titanium Ferrite Sputtering Target Packaging

Our Titanium Ferrite Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

We specialize in producing high purity Titanium Ferrite Sputtering Targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.

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Titanium Ferrite Sputtering Target, TiFe2O4
Average rating:  
 1 reviews
by John Hollowell on Titanium Ferrite Sputtering Target, TiFe2O4

I bought 2 sets and love them! Great quality and great price! Five Stars!