(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0158 Lanthanum Aluminate Sputtering Target, LaAlO3

Chemical Formula: LaAlO3
Catalog Number: ST0158
CAS Number: 12003-65-5
Purity: >99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The lanthanum aluminate sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality lanthanum aluminate sputter targets at the most competitive prices.

Lanthanum Aluminate MSDS File




Description

Lanthanum Aluminate Sputtering Target Description

Lanthanum aluminate sputtering target from Stanford Advanced Materials is an oxide sputtering material containing La, Al and O.

LanthanumLanthanum, a soft, malleable, silvery-white white metal, is one of the most reactive rare earth elements. It can be utilized to make special optical glasses and can also be utilized to make steel more malleable. In addition, lanthanum is helpful in wastewater treatment and oil refining. Scientists have given the name of “super calcium” to Lanthanum due to its application of photoconversion film.

Related Product: Lanthanum Sputtering Target

AluminiumAluminium, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaning bitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Aluminium Sputtering Target

OxygenOxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Lanthanum Aluminate Sputtering Target Bonding Service

Indium Bonding and Elastomeric Target Bonding Service are available for the lanthanum aluminate sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Target Bonding Services

Available Sizes of Lanthanum Aluminate Sputtering Target

Material Size
Lanthanum Aluminate, LaAlO3 1.00″ Dia. x 0.125″ Thick
Lanthanum Aluminate, LaAlO3 1.00″ Dia. x 0.250″ Thick
Lanthanum Aluminate, LaAlO3 2.00″ Dia. x 0.125″ Thick
Lanthanum Aluminate, LaAlO3 2.00″ Dia. x 0.250″ Thick
Lanthanum Aluminate, LaAlO3 3.00″ Dia. x 0.125″ Thick
Lanthanum Aluminate, LaAlO3 3.00″ Dia. x 0.250″ Thick
Lanthanum Aluminate, LaAlO3 4.00″ Dia. x 0.125″ Thick
Lanthanum Aluminate, LaAlO3 4.00″ Dia. x 0.250″ Thick
Lanthanum Aluminate, LaAlO3 6.00″ Dia. x 0.250″ Thick
Lanthanum Aluminate, LaAlO3 8.00″ Dia. x 0.250″ Thick

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Packing

Our lanthanum aluminate sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

SAM’s lanthanum aluminate sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.

Submit your review
1
2
3
4
5
Submit
     
Cancel

Create your own review

Lanthanum Aluminate Sputtering Target, LaAlO3
Average rating:  
 1 reviews
by Brian Wakefield on Lanthanum Aluminate Sputtering Target, LaAlO3

Super worthful. The package is tight and the shipping is fast.