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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0164 Lanthanum Titanate Sputtering Target, LaTiO3

Chemical Formula: LaTiO3
Catalog Number: ST0164
CAS Number: 12031-47-9
Purity: >99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The lanthanum titanate sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality lanthanum titanate oxide sputtering targets at the most competitive prices.

Lanthanum Titanate MSDS File




Description

Lanthanum Titanate Sputtering Target Description

Lanthanum titanate sputtering target from Stanford Advanced Materials is an oxide sputtering material containing La, Ti and O.

LanthanumLanthanum, a soft, malleable, silvery-white white metal, is one of the most reactive rare earth elements. It can be utilized to make special optical glasses and can also be utilized to make steel more malleable. In addition, lanthanum is helpful in wastewater treatment and oil refining. Scientists have given the name of “super calcium” to Lanthanum due to its application of photoconversion film.

Related Product: Lanthanum Sputtering Target

TitaniumTitanium is a chemical element that originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius. “Ti” is the canonical chemical symbol of titanium. Its atomic number in the periodic table of elements is 22 with a location at Period 4 and Group 4, belonging to the d-block. The relative atomic mass of titanium is 47.867(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Titanium Sputtering Target

OxygenOxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Available Sizes of Lanthanum Titanate Sputtering Target

Material Size
Lanthanum Titanate, LaTiO3 2.00″ Dia. x 0.125″ Thick
Lanthanum Titanate, LaTiO3 2.00″ Dia. x 0.250″ Thick
Lanthanum Titanate, LaTiO3 3.00″ Dia. x 0.125″ Thick
Lanthanum Titanate, LaTiO3 3.00″ Dia. x 0.250″ Thick
Lanthanum Titanate, LaTiO3 4.00″ Dia. x 0.125″ Thick
Lanthanum Titanate, LaTiO3 4.00″ Dia. x 0.250″ Thick
Lanthanum Titanate, LaTiO3 5.00″ Dia. x 0.125″ Thick
Lanthanum Titanate, LaTiO3 5.00″ Dia. x 0.250″ Thick
Lanthanum Titanate, LaTiO3 6.00″ Dia. x 0.125″ Thick
Lanthanum Titanate, LaTiO3 6.00″ Dia. x 0.250″ Thick
Lanthanum Titanate, LaTiO3 7.00″ Dia. x 0.125″ Thick
Lanthanum Titanate, LaTiO3 7.00″ Dia. x 0.250″ Thick
Lanthanum Titanate, LaTiO3 8.00″ Dia. x 0.125″ Thick
Lanthanum Titanate, LaTiO3 8.00″ Dia. x 0.250″ Thick

Lanthanum Titanate Sputtering Target Target Bonding

Indium Bonding is available for Lanthanum Titanate Sputtering Targets. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services.

Lanthanum Titanate Sputtering Target Packaging

Our Lanthanum Titanate Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

We specialize in producing high purity Lanthanum Titanate Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Lanthanum Titanate (LaTiO3) Sputtering Target
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