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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0138 Bismuth Oxide Sputtering Target, Bi2O3

Chemical Formula: Bi2O3
Catalog Number: ST0138
CAS Number: 1304-76-3
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

 Stanford Advanced Materials (SAM) provides the best bismuth oxide sputtering target on the market with a competitive price and great delivery time. Customized forms are available upon request.




Description

Bismuth Oxide Sputtering Target Description

Bismuth oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula Bi2O3.

BismuthBismuth is a chemical element that originated from the German ‘Bisemutum’ a corruption of ‘Weisse Masse’ meaning white mass. It was early used in 1753 and discovered by C.F. Geoffroy. “Bi” is the canonical chemical symbol of bismuth. Its atomic number in the periodic table of elements is 83 with location at Period 6 and Group 15, belonging to the p-block. The relative atomic mass of bismuth is 208.98040(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Bismuth (Bi) Sputtering Target

OxygenOxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Oxide Ceramic Sputtering Target

Bismuth Oxide Sputtering Target Specification

Material Type Bismuth Oxide
Symbol Bi2O3
Color/Appearance Yellow
Melting Point 817 °C
Density 8.9 g/cm3
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

Bismuth Oxide Sputtering Target Handling Notes

1. Indium bonding is recommended for Bi2O3 sputtering target, due to some of its characteristics not amenable to sputtering like brittleness, low thermal conductivity, etc.

2. This material has a low thermal conductivity are susceptible to thermal shock.

Bismuth Oxide Sputtering Target Application

The bismuth oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Bismuth Oxide Sputtering Target Packing

Our bismuth oxide sputter targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High-quality bismuth oxide sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Bismuth Oxide Sputtering Target, Bi2O3
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