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(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 09:00 - 18:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0439 Indium Iron Oxide (InFe2O4) Sputtering Target

Chemical Formula: InFe2O4
Catalog Number: ST0439
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made




Description

Available Sizes of Indium Iron Oxide Sputtering Target

Material Size
Indium Iron Oxide, InFe2O4 2.00″ Dia. x 0.125″ Thick
Indium Iron Oxide, InFe2O4 2.00″ Dia. x 0.250″ Thick
Indium Iron Oxide, InFe2O4 3.00″ Dia. x 0.125″ Thick
Indium Iron Oxide, InFe2O4 3.00″ Dia. x 0.250″ Thick
Indium Iron Oxide, InFe2O4 4.00″ Dia. x 0.125″ Thick
Indium Iron Oxide, InFe2O4 4.00″ Dia. x 0.250″ Thick

Description of Indium Iron Oxide Sputtering Target

Indium

IndiumIndium is a chemical element originated from the Latin ‘indicium’, meaning violet or indigo. It was first mentioned in 1863 and observed by F. Reich and T. Richter. The isolation was later accomplished and announced by T. Richter. “In” is the canonical chemical symbol of indium. Its atomic number in the periodic table of elements is 49 with location at Period 5 and Group 13, belonging to the p-block. The relative atomic mass of indium is 114.818(3) Dalton, the number in the brackets indicating the uncertainty.

Iron

ironIron, also called ferrum, is a chemical element originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

Packaging of Indium Iron Oxide Sputtering Target

Our Indium Iron Oxide Sputter Targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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We specialize in producing high purity Indium Iron Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.

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Indium Iron Oxide Sputtering Target
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