Chemical Formula: InGaZnOx
Catalog Number: ST0151
CAS Number: 151248-91-8
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
IGZO sputtering target is available in various forms, purities, sizes, and prices. Other customized sputtering targets & evaporation materials are also available upon your requirements in Stanford Advanced Materials (SAM).
IGZO sputtering target, whose full name is indium gallium zinc oxide target, which contains four elements: indium (In), gallium (Ga), zinc (Zn) and oxygen (O). IGZO is a new type of semiconductor material with higher electron mobility than amorphous silicon (α-Si). IGZO is used as a channel material in a new generation of high-performance thin-film transistors (TFTs) to improve display panel resolution and make large-screen OLED TVs possible.
|Material Type||Indium Gallium Zinc Oxide|
|Color/Appearance||White, Crystalline Solid|
|Melting Point||850 °C|
|Theoretical Density||6.5 g/cm3|
|Type of Bond||Indium|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
IGZO sputter targets are used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. The applications of IGZO thin films include transparent conductive oxide films, LED display, MEMS devices, etc.
Indium gallium zinc oxide sputtering target can be bonded by Indium Bonding. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our indium gallium zinc oxide IGZO sputtering targets are tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High Purity IGZO sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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These are the right size for my needs and arrived in perfect condition.