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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0151 IGZO Sputtering Target, Indium Gallium Zinc Oxide

Chemical Formula: InGaZnOx
Catalog Number: ST0151
CAS Number: 151248-91-8
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

IGZO sputtering target is available in various forms, purities, sizes, and prices. Other customized sputtering targets & evaporation materials are also available upon your requirements.


IGZO Sputtering Target Description

IGZO sputtering target, whose full name is indium gallium zinc oxide target, which contains four elements: indium (In), gallium (Ga), zinc (Zn) and oxygen (O). IGZO is a new type of semiconductor material with higher electron mobility than amorphous silicon (α-Si). IGZO is used as a channel material in a new generation of high-performance thin-film transistors (TFTs) to improve display panel resolution and make large-screen OLED TVs possible.

IGZO Sputtering Target Specification

Material Type Indium Gallium Zinc Oxide
Symbol IGZO
Color/Appearance White, Crystalline Solid
Melting Point 850 °C
Theoretical Density  6.5 g/cm3
Type of Bond Indium
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

IGZO Sputtering Target Application

IGZO sputter targets are used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. The applications of IGZO thin films include transparent conductive oxide films, LED display, MEMS devices, etc.

IGZO Sputtering Target Bonding Services

Indium gallium zinc oxide sputtering target can be bonded by Indium Bonding. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Target Bonding Services


Our sputtering materials are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

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High Purity IGZO sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Indium Gallium Zinc Oxide (IGZO) Sputtering Target
Average rating:  
 1 reviews
by Leif Wiebe on Indium Gallium Zinc Oxide (IGZO) Sputtering Target

These are the right size for my needs and arrived in perfect condition.