Chemical Formula: CeO2
Catalog Number: ST0140
CAS Number: 1306-38-3
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Indium Bonding and Elastomeric Target Bonding Service are available for Cerium Oxide Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
|Material Type||Cerium (IV) Oxide|
|Color/Appearance||White or Pale Yellow, Crystalline Solid|
|Melting Point (°C)||~2,600|
|Theoretical Density (g/cc)||7.13|
|Type of Bond||Indium, Elastomer|
|Comments||Very little decomposition.|
Cerium is a chemical element originated from Ceres, the Roman God of agriculture. It was first mentioned in 1803 and observed by H. Klaproth, J. Berzelius, and W. Hisinger. The isolation was later accomplished and announced by G. Mosander. “Ce” is the canonical chemical symbol of cerium. Its atomic number in the periodic table of elements is 58 with location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of cerium is 140.116(1) Dalton, the number in the brackets indicating the uncertainty.
Oxygen is a chemical element originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Our Cerium Oxide Sputtering Target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity Cerium Oxide Sputtering Target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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