Chemical Formula: CeO2
Catalog Number: ST0140
CAS Number: 1306-38-3
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Stanford Advanced Materials (SAM) provides the best cerium oxide sputtering target on the market with a competitive price and great delivery time. Customized forms are available upon request.
Cerium oxide sputtering target from Stanford Advanced Materials is an oxide sputtering material with the formula CeO2.
Cerium is a chemical element that originated from Ceres, the Roman God of agriculture. It was first mentioned in 1803 and observed by H. Klaproth, J. Berzelius, and W. Hisinger. The isolation was later accomplished and announced by G. Mosander. “Ce” is the canonical chemical symbol of cerium. Its atomic number in the periodic table of elements is 58 with a location at Period 6 and Group 3, belonging to the f-block. The relative atomic mass of cerium is 140.116(1) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Cerium (Ce) Sputtering Target
Oxygen is a chemical element that originated from the Greek ‘oxy’ and ‘genes’ meaning acid-forming. It was first mentioned in 1771 and observed by W. Scheele. The isolation was later accomplished and announced by W. Scheele. “O” is the canonical chemical symbol of oxygen. Its atomic number in the periodic table of elements is 8 with a location at Period 2 and Group 16, belonging to the p-block. The relative atomic mass of oxygen is 15.9994(3) Dalton, the number in the brackets indicating the uncertainty.
Related Product: Oxide Ceramic Sputtering Target
|Material Type||Cerium (IV) Oxide|
|Color/Appearance||White or Pale Yellow, Crystalline Solid|
|Melting Point (°C)||~2,600|
|Theoretical Density (g/cc)||7.13|
|Type of Bond||Indium, Elastomer|
|Comments||Very little decomposition.|
Indium Bonding and Elastomeric Target Bonding Service are available for cerium oxide sputtering target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
The cerium oxide sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Our cerium oxide sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM specializes in producing high purity cerium oxide sputtering target with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Get an inquiry right now.
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