Chemical Formula: Bi2.4MnO3
Catalog Number: ST0431
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Bismuth manganate sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide to us.
Bismuth manganate sputtering target is composed of bismuth, manganese, and oxide with the chemical formula of Bi2.4MnO3. High-purity bismuth manganate sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Bismuth Sputtering Target, Manganese Sputtering Target
| Material Type | Bismuth manganate |
| Symbol | Bi2.4MnO3 |
| Color/Appearance | Black solid |
| PH | 6.5 |
| Density | 7.0 g/cm3 |
| Type of Bond | Elastomer, Indium |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Our bismuth manganate sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high-purity bismuth manganate sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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My daughter used them for science experiment, worked exactly how they were supposed to.
