Chemical Formula: Bi(1-x)LaxFeO3
Catalog Number: ST0429
Purity: 99.9%, 99.99%, 99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Bismuth lanthanum ferrite sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide with us.
Bismuth lanthanum ferrite is composed of bismuth, lanthanum, iron, and oxide with the chemical formula of Bi0.9Ca0.1FeO3. High-purity bismuth lanthanum ferrite sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
|Material Type||Bismuth Lanthanum Ferrite|
|Type of Bond||Elastomer, Indium|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Other sizes are also available. Please contact us for customized sputtering targets.
Our bismuth lanthanum ferrite sputter targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high-purity bismuth lanthanum ferrite sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD), and physical vapor deposition (PVD) display and optical applications.
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I love that I could get so many for such a great price! I won’t worry about my experiment will fail!