Chemical Formula:Bi0.9Ca0.1FeO3
Catalog Number: ST0427
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Bismuth calcium ferrite sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is capable of supplying custom sputtering materials per any specs/drawings you provide with us.
Bismuth calcium ferrite sputtering target is composed of bismuth, calcium, iron, and oxide with the chemical formula of Bi0.9Ca0.1FeO3. High-purity bismuth calcium ferrite sputtering targets play a huge role in deposition processes to ensure high-quality deposited film. Stanford Advanced Materials (SAM) specializes in producing up to 99.9995% purity sputtering targets using quality assurance processes to guarantee product reliability.
Related products: Bismuth Sputtering Target, Calcium Sputtering Target, Iron Sputtering Target
| Material Type | Bismuth calcium ferrite |
| Symbol | Bi0.9Ca0.1FeO3 |
| Color/Appearance | Solid |
| Melting Point | N/A |
| Density | N/A |
| Type of Bond | Elastomer, Indium |
| Available Sizes | Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″ Thick: 0.125″, 0.250″ |
Other sizes are also available. Please contact us for customized sputtering targets.
Our bismuth calcium ferrite sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.
We specialize in producing high-purity bismuth calcium ferrite sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display, and optical applications.
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I highly recommend SAM’s products especially if you’re just starting to get into sputtering experiments, because they offer sputtering target of all available purity which helped a lot. Will buy again.
