Chemical Formula: Li2CO3
Catalog Number: ST0875
CAS Number: 554-13-2
Purity: 99.9% ~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Lithium carbonate sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality lithium carbonate sputter targets at the most competitive price.
Lithium carbonate sputtering target is a white sputter target with the formula Li2CO3. It is widely used in the processing of metal oxides.
Lithium is a chemical element originated from the Greek ‘lithos’ meaning stone. It was first mentioned in 1817 and observed by A. Arfwedson. The isolation was later accomplished and announced by W. T. Brande. “Li” is the canonical chemical symbol of lithium. Its atomic number in the periodic table of elements is 3 with location at Period 2 and Group 1, belonging to the s-block. The relative atomic mass of lithium is 6.941(2) Dalton, the number in the brackets indicating the uncertainty. Related: Lithium Sputtering Target
Carbon is a chemical element originated from the Latin ‘carbo’, meaning charcoal. “C” is the canonical chemical symbol of carbon. Carbon has a hexagonal crystal structure. It has superimposed countless parallel layers. The carbon atoms in each layer are distributed on the top corners of the regular hexagonal plane, forming an ordered arrangement in a three-dimensional space. It has good electrical and thermal conductivity, good electrical and thermal conductivity, chemical stability, and lubricity. Related: Carbon Sputtering Target
|Material Type||Lithium Carbonate|
|Melting Point||723 °C|
|Available Sizes||Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
Our lithium carbonate sputtering targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
High quality lithium carbonate sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current prices of sputtering targets and other deposition materials that are not listed.
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