(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0413 Carbon Sputtering Target, C Target

Chemical Formula: C
Catalog Number: ST0413
CAS Number: 7440-44-0
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The carbon sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) has extensive machining capabilities to provide carbon targets in standard sizes or custom products finished to your exact specifications. 


Carbon Sputtering Target Description

CarbonCarbon sputtering target has the same properties as carbon. Carbon is a chemical element originated from the Latin ‘carbo’, meaning charcoal. “C” is the canonical chemical symbol of carbon. Carbon has a hexagonal crystal structure. It has superimposed countless parallel layers. The carbon atoms in each layer are distributed on the top corners of the regular hexagonal plane, forming an ordered arrangement in a three-dimensional space. Carbon sputtering targets have good electrical and thermal conductivity, good electrical and thermal conductivity, chemical stability, and lubricity.

Carbon Sputtering Target Specification

Material Type Carbon
Symbol C
Color/Appearance Black solid
Melting Point 3652 – 3697 °C
Boiling Point 4200 °C
Density 2.267 g/cm3
Available Sizes Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Carbon Sputtering Target Application

Carbon sputtering targets are used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. The applications for carbon are many and include its use as an alloying element with iron in the manufacture of steel, its use as brushes in electrical generators and motors, the use of colloidal graphite or carbon to coat surfaces (e.g. glass), in electrical assemblies to absorb microwaves and inhibit photoelectrons and secondary electrons, and the use of high purity carbon (graphite) in nuclear reactors to moderate neutrons.


Our C sputter target products are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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Carbon sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Carbon(C) Sputtering Target
Average rating:  
 1 reviews
by Craig Schomaker on Carbon(C) Sputtering Target

Individually boxed and shipped nicely. Will buy them from SAM again.