Company Dynamic | Stanford Advanced Materials

Ultra low radiation coated glass building

December 26, 2018Julissa GreenBlog, Sputtering Target0

Ultra low radiation silver-coated glass production process

Ultra low radiation silver-coated glass production process Low-emission coated glass has now been widely accepted by the public that this kind of glass is widely used in automobiles, doors and windows, and glass curtain walls. The core functional layer for low-emission coated glass is a silver film or silver-doped alloy film layer, which bears the...

December 25, 2018Julissa GreenBlog, Sputtering Target, Sputtering Technology0

Effect of Sputtering Target Purity on Large-Area Coating Production

Effect of Sputtering Target Purity on Large-Area Coating Production The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. When the substrate enters the high vacuum coating chamber, if the sputtering target is not pure enough, under the action of the electric field and the magnetic field,...

December 20, 2018Julissa GreenBlog, Sputtering Target, Sputtering Technology0

Using Scandium Aluminum Sputtering Target to Prepare ScAlN Film

Scandium nitride (ScN) is a metal nitride semiconductor. The crystal structure of ScN is generally rock salt and non-polar. However, the first principle calculation indicates that ScN may also have a wurtzite structure and can be made into Sc-IIIA-Nitride. The IIIA nitride refers to AlN, GaN, and InN, and the structure of the nitride is...

December 18, 2018Julissa GreenBlog, Sputtering Target, Sputtering Technology0

Recent Studies on Titanium Dioxide Film

Titanium dioxide (TiO2) is a hard and chemically resistant oxide of titanium. Using TiO2 sputtering target can obtain good quality titanium dioxide films, which have been widely used in various applications due to their multiple interesting properties. The first half of this passage introduces some of the properties and applications of titanium oxide film, and the latter...

December 14, 2018Julissa GreenBlog, Sputtering Target0

High-purity Sputtering Target Guarantee the Film Quality

Sputtering is a method of physical vapor deposition (PVD) technologies and is one of the main techniques for preparing electronic thin film materials. It utilizes the ions generated by the ion source to accelerate the aggregation in a high vacuum to form an ion beam with high speed and high energy. The ion beam bombards...

December 12, 2018Julissa GreenBlog, Evaporation Materials0

3 Important Applications of Gold Evaporation Materials

High-purity gold has excellent physical and chemical properties, such as low contact resistance and stability, easy bonding, and easy film formation. By adding other elements, gold can be alloyed to Gold Germanium, Gold Gallium and Gold Beryllium. The flow point of these materials can be changed, and their wettability and adhesion with different materials can...

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