Company Dynamic | Stanford Advanced Materials

June 4, 2025Julissa GreenBlog, Manufacturing Method, Sputtering Target0

Choosing Powder Metallurgy for High-Performance Sputtering Targets

1. Introduction Sputtering targets play a central role in physical vapor deposition (PVD) processes, forming the thin functional layers found in semiconductors, optical components, solar panels, and wear-resistant coatings. As industries continue to push for better film quality, consistency, and performance, the demand for advanced sputtering targets grows accordingly. In particular, refractory metals such as...

Inner linings for components in acid processing

May 28, 2025Julissa GreenApplications, Blog, Comparison, Sputtering Target0

Tantalum and Niobium Targets for High-Temperature Corrosion-Resistant Films

1. Introduction Refractory metals like tantalum (Ta) and niobium (Nb) play an increasingly important role in thin film technology, particularly for environments that demand both high-temperature stability and corrosion resistance. These two elements, known for their exceptionally high melting points and strong chemical inertness, have found widespread use in advanced protective coatings. As industries such...

April 29, 2025Julissa GreenBlog, Crucible Materials0

Graphite Crucibles Used for Metal Smelting

Introduction Crucibles are widely used in metallurgy, chemical processing, and a variety of industries. Among these crucibles, graphite crucibles are useful for the smelting of non-ferrous metals and alloys with their desirable properties. Let’s have a detailed discussion about the features, competitiveness, and uses of graphite crucibles. Hope that you can have a better understanding...

April 25, 2025Julissa GreenBlog, Semiconductors, Sputtering Target0

The Key Role of Tantalum Targets in Semiconductor Manufacturing

When we think about semiconductor manufacturing, we often picture highly advanced technologies, intricate processes, and an army of materials working in the background. Among these materials, tantalum (Ta) sputtering targets play a surprisingly crucial role. But why exactly is this unassuming metal so important for semiconductor devices? Let’s dive in. What Makes Tantalum So Special...

April 19, 2025Julissa GreenApplications, Blog, Comparison, CVD, Most Popular, PVD0

Table Comparison: Physical Vapor Deposition Vs. Chemical Vapor Deposition

1. Introduction to PVD and CVD Physical vapor deposition (PVD) and chemical vapor deposition (CVD) are two essential thin-film deposition techniques widely used in semiconductors, tooling, optics, and clean energy. PVD relies on physical transformation (solid to vapor to solid), while CVD creates coatings through chemical reactions on the substrate surface. 2. Technical Comparison Table...

April 16, 2025Julissa GreenBlog, Sputtering Target0

Metal, Ceramic, or Alloy: Choosing the Right Sputtering Target

When it comes to thin film deposition, the choice of sputtering target material can make or break the performance of your final product. For procurement specialists and product managers working in materials science, semiconductors, optics, or advanced coatings, understanding the distinctions between metal, ceramic, and alloy targets is critical. This article breaks down the characteristics,...

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