All for Joomla All for Webmasters
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0063 Aluminum Magnesium Sputtering Target, Al/Mg

Chemical Formula: Al/Mg
Catalog Number: ST0063
CAS Number: 1302-88-1
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The aluminum magnesium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality aluminum magnesium sputter targets at the most competitive prices.




Description

Aluminum Magnesium Sputtering Target Description

Aluminum magnesium sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Al and Mg.

MagnesiumMagnesium is a chemical element that originated from Magnesia, a district of Eastern Thessaly in Greece. It was first mentioned in 1755 and observed by J. Black. The isolation was later accomplished and announced by H. Davy. “Mg” is the canonical chemical symbol of magnesium. Its atomic number in the periodic table of elements is 12 with a location at Period 3 and Group 2, belonging to the s-block. The relative atomic mass of magnesium is 24.3050(6) Dalton, the number in the brackets indicating the uncertainty.

AluminumAluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaning bitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Aluminum Magnesium Sputtering Target Specification

Material Type Aluminum Magnesium
Symbol Al/Mg
Color/Appearance Silvery, Metallic Target
Melting Point 600 °C
Density 1.9 g/cm3
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Aluminum Magnesium Sputtering Target Application

The aluminum magnesium sputtering materials are used for CD-ROM, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Aluminum Magnesium Sputtering Target Packing

Our aluminum magnesium sputter coater targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High-quality aluminum magnesium sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

Submit your review
1
2
3
4
5
Submit
     
Cancel

Create your own review

Aluminum Magnesium Sputtering Target, Al/Mg
Average rating:  
 1 reviews
by Samuel Lee on Aluminum Magnesium Sputtering Target, Al/Mg

It came exactly as promised. Overall it came exactly as promised. I love it.