Chemical Formula: W
Catalog Number: ST0054
CAS Number: 7440-33-7
Purity: 99.9%, 99.95%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Tungsten sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) is a trusted sputtering target supplier working with international partners to bring you the highest quality products with the most affordable pricing.
Tungsten Sputtering Target Safety Data Sheet
Tungsten sputtering target is made of high purity tungsten metal. Tungsten is a rare metal found naturally on Earth almost exclusively combined with other elements in chemical compounds rather than alone. It was identified as a new element in 1781 and first isolated as a metal in 1783. Its important ores include wolframite and scheelite.
Tungsten target has the highest melting point of all the elements discovered, melting at 3422 °C. It also has the highest boiling point, at 5930 °C. Its density is 19.25 times that of water, comparable to that of uranium and gold, and much higher (about 1.7 times) than that of lead. Polycrystalline tungsten is an intrinsically brittle and hard material (under standard conditions, when uncombined), making it difficult to work. However, pure single-crystalline tungsten is more ductile and can be cut with a hard-steel hacksaw.
|Color/Appearance||Grayish White, Lustrous, Metallic|
|Type of Bond||Indium, Elastomer|
|Comments||Forms volatile oxides. Films hard and adherent.|
|Available Sizes||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
High performance tungsten sputtering materials are used for thin film coating applications, CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.
Tungsten and tungsten alloys have numerous applications, including incandescent light bulb filaments, fuel cell, X-ray tubes (as both the filament and target), electrodes in gas tungsten arc welding, superalloys, and radiation shielding. Tungsten’s hardness and high density give it military applications in penetrating projectiles. Tungsten compounds are also often used as industrial catalysts.
Indium Bonding and Elastomeric Target Bonding Service are available for the W sputtering target. Stanford Advanced Materials (SAM) is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Tungsten sputter targets from Stanford Advanced Materials are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s tungsten sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film deposition materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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I bought these for a school project, and they worked pretty well! After contacting the company, they were extremely helpful, telling me the price, shipping time, and the recommended size for the sputtering target.
These work great. I've only used them to sputter a thin film. They are a great price too.