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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0113 Titanium Aluminum Sputtering Target, Ti/Al

Chemical Formula: Ti/Al
Catalog Number: ST0113
CAS Number: 12004-78-3
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The titanium aluminum sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality titanium aluminum sputter targets at the most competitive prices.




Description

Titanium Aluminum Sputtering Target Description

Titanium aluminum sputtering target from Stanford Advanced Materials is a silvery alloy sputtering material containing Ti and Al.

TitaniumTitanium is a chemical element originated from Titans, the sons of the Earth goddess of Greek mythology. It was first mentioned in 1791 and observed by W. Gregor. The isolation was later accomplished and announced by J. Berzelius. “Ti” is the canonical chemical symbol of titanium. Its atomic number in the periodic table of elements is 22 with location at Period 4 and Group 4, belonging to the d-block. The relative atomic mass of titanium is 47.867(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Titanium (Ti) Sputtering Target

AluminumAluminium, also called aluminum, is a chemical element originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminium. Its atomic number in the periodic table of elements is 13 with location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminium is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Aluminum (Al) Sputtering Target

Titanium Aluminum Sputtering Target Applications

The titanium aluminum sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packaging

Our titanium aluminum sputter targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High-quality titanium aluminum sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Titanium Aluminum Sputtering Target, Ti/Al
Average rating:  
 1 reviews
by Mark Browne on Titanium Aluminum Sputtering Target, Ti/Al

I highly recommend SAM’s products especially if you’re just starting to get into sputtering experiments because they offer the sputtering target of all available purity which helped a lot. Will buy again.