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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0064 Aluminum Nickel Sputtering Target, Al/Ni

Chemical Formula: Al/Ni
Catalog Number: ST0064
CAS Number: 12003-78-0
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The aluminum nickel sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality aluminum nickel sputter targets at the most competitive prices.




Description

Aluminum Nickel Sputtering Target Description

Aluminum nickel sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Al and Ni.

AluminumAluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaning bitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

NickelNickel is a chemical element that originated from the shortened of the German ‘kupfernickel’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned in 1751 and observed by F. Cronstedt. The isolation was later accomplished and announced by F. Cronstedt. “Ni” is the canonical chemical symbol of nickel. Its atomic number in the periodic table of elements is 28 with a location at Period 4 and Group 10, belonging to the d-block. The relative atomic mass of nickel is 58.6934(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Aluminum Sputtering TargetNickel Sputtering Target

Aluminum Nickel Sputtering Target Specification

Material Type Aluminum Nickel
Symbol Al/Ni
Color/Appearance Silvery, Metallic Target
Melting Point 1385 °C
Density 7.5 g/cm3
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Aluminum Nickel Sputtering Target Application

The aluminum nickel sputtering materials are used for CD-ROM, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Aluminum Nickel Sputtering Target Packing

Our aluminum nickel sputter coater targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High-quality aluminum nickel sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Aluminum Nickel Sputtering Target, Al/Ni
Average rating:  
 1 reviews
by Mason Patrick on Aluminum Nickel Sputtering Target, Al/Ni

Wow! What a great purchase! This pack should last me a long time! Recommended!