(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0107 Nickel Vanadium Sputtering Target, Ni/V

Chemical Formula: Ni/V
Catalog Number: ST0107
CAS Number: 7440-02-0 | 7440
Purity: 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

The nickel vanadium sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high-quality nickel vanadium sputter targets at the most competitive prices.

Description

Nickel Vanadium Sputtering Target Description

The nickel vanadium sputtering target from Stanford Advanced Materials is an alloy sputtering material containing Ni and V.

NickelNickel is a chemical element that originated from the shortened of the German ‘kupfernickel’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned in 1751 and observed by F. Cronstedt. The isolation was later accomplished and announced by F. Cronstedt. “Ni” is the canonical chemical symbol of nickel. Its atomic number in the periodic table of elements is 28 with a location at Period 4 and Group 10, belonging to the d-block. The relative atomic mass of nickel is 58.6934(2) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Nickel Sputtering Target

Vanadium

Vanadium is a chemical element that originated from Vanadis, an old Norse name for the Scandinavian goddess Freyja. It was first mentioned in 1801 and observed by M. del Río. The isolation was later accomplished and announced by N.G.Sefström. “V” is the canonical chemical symbol of vanadium. Its atomic number in the periodic table of elements is 23 with a location at Period 4 and Group 5, belonging to the d-block. The relative atomic mass of vanadium is 50.9415(1) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Vanadium Sputtering Target

Nickel Vanadium Sputtering Target Specification

Material Type Nickel Vanadium
Compound Formula Ni/V
Molecular Weight 109.63
Appearance Metallic target
Melting Point 1775-1875 °C

Nickel Vanadium Sputtering Target Application

The nickel vanadium sputtering target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Nickel Vanadium Sputtering Target Packaging

Our nickel vanadium sputtering target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

High-quality nickel vanadium sputtering target is available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with the highest possible density and smallest possible average grain sizes. Please send us an inquiry for the current prices of the sputtering targets and other deposition materials that are not listed.

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Nickel Vanadium Sputtering Target, Ni/V
Average rating:  
 1 reviews
by Michelle Segovia on Nickel Vanadium Sputtering Target, Ni/V

Five Stars. Great product for the price! Easy to use.