Chemical Formula: V
Catalog Number: ST0055
CAS Number: 7440-62-2
Purity: 99.5%, 99.9%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made
Vanadium Sputtering Target is made of vanadium metal. Vanadium is a hard, silvery-grey, malleable transition metal. Vanadium occurs naturally in about 65 minerals and in fossil fuel deposits. It is produced in China and Russia from steel smelter slag. Other countries produce it either from magnetite directly, flue dust of heavy oil, or as a byproduct of uranium mining. It is mainly used to produce specialty steel alloys such as high-speed tool steels. The most important industrial vanadium compound, vanadium pentoxide, is used as a catalyst for the production of sulfuric acid. The vanadium redox battery for energy storage may be an important application in the future.
|Color/Appearance||Silvery Gray Metallic|
|Thermal Conductivity||30.7 W/m.K|
|Type of Bond||Wets Mo. E-beam-evaporated films preferred.|
|Target Dimensions & Thickness||Dia.: 1.0″, 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″
We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.
The main use of vanadium is in alloys, especially with steel.
85% of all the vanadium produced goes into steel, 10% goes into alloys of titanium and 5% into all other uses.
Elastomeric Target Bonding Service is available for pure metal V Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.
Our high purity vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
SAM’s vanadium sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film deposition materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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Exactly what I needed and expected. Met all specifications -- diameter, length were right on.
So much high quality for such a cheap price. Came exactly as described and good quality.