ST0055 Vanadium Sputtering Target (V Target)

High-Purity Vanadium for Advanced Thin Film Applications

Vanadium Sputtering Target Description

Vanadium sputtering targets retain the key properties of their source material. Vanadium is a hard, silvery-gray, malleable transition metal naturally found in about 65 minerals and fossil fuel deposits. Major production comes from China and Russia, primarily extracted from steel smelter slag. Other countries produce vanadium from magnetite, flue dust of heavy oil, or as a byproduct of uranium mining.

Vanadium is mainly used to produce specialty steel alloys, such as high-speed tool steels. Its most important industrial compound, vanadium pentoxide, catalyzes sulfuric acid production. Additionally, vanadium redox batteries are emerging as a promising technology for energy storage.

Vanadium Sputtering Target Specification

We also offer other customized shapes and sizes of the sputtering targets. Please send us an inquiry for more information.

Tantalum Sputtering Target Options

Vanadium Sputtering Target Application

Standard vanadium sputtering targets are widely used in thin-film coating applications including CD-ROMs, decorative coatings, flat panel displays, functional coatings, and other optical information storage industries. They are also applied in glass coating industries such as automotive and architectural glass, as well as in optical communication.

In addition to thin film applications, vanadium’s primary industrial use is in alloys—especially steel. Approximately 85% of vanadium produced is used in steel alloys, 10% in titanium alloys, and the remaining 5% in other applications.

Vanadium Sputtering Target Bonding Service

Elastomeric Target Bonding Service is available for pure metal V Vanadium Sputtering Target. Stanford Advanced Materials is devoted to machining standard backing plates and working together with the Taiwan Bonding Company for providing bonding services. For questions about target bonding materials, methods and services, please click here.

Bonded Assemblies Ordering Options

Packaging

Our high purity vanadium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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Vanadium sputtering targets are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film deposition materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

FAQs for Vanadium Sputtering Target

Q1: What purity levels are available for vanadium sputtering targets?
A: Vanadium sputtering targets are commonly available with purities ranging from 99.5% to 99.99%, depending on the specific application requirements. Higher purity targets ensure better film quality and performance in thin film deposition processes.

Q2: Can custom sizes and bonding types be ordered for vanadium sputtering targets?
A: Yes, custom sizes and shapes are available beyond standard diameters and thicknesses. Additionally, bonding options such as Indium bonding and elastomeric bonding are offered to optimize thermal and mechanical performance during sputtering.

Q3: What are the typical applications of vanadium sputtering targets?
A: Vanadium sputtering targets are widely used in thin film coatings for electronics, optics, and decorative applications. They are also essential in producing specialty alloys and components in industries such as semiconductor manufacturing, optical communication, and energy storage.