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(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0077 Cobalt Aluminum Sputtering Target, Co/Al

Chemical Formula: Co/Al
Catalog Number: ST0077
CAS Number: 7440-48-4 | 7429
Purity: 99.9%, 99.95%, 99.99%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

Cobalt aluminum sputtering target is available in various forms, purities, sizes, and prices. Stanford Advanced Materials (SAM) offers high quality cobalt aluminum sputter target at the most competitive price.




Description

Cobalt Aluminum Sputtering Target Description

Cobalt aluminum sputtering target from Stanford Advanced Materials is a silvery alloy sputtering material containing Co and Al.

Cobalt

Cobalt is a chemical element that originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with a location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.

Related Product: Cobalt Sputtering Target

AluminumAluminium, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminium. Its atomic number in the periodic table of elements is 13 with location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminium is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Cobalt Aluminum Sputtering Target Packaging

Our cobalt aluminum sputtering targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.

Get Contact

SAM’s cobalt aluminum sputtering targets are available in various forms, purities, and sizes. We specialize in producing high purity physical vapor deposition (PVD) materials with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Cobalt Aluminum Sputtering Target, Co/Al
Average rating:  
 1 reviews
by STEPHANIE on Cobalt Aluminum Sputtering Target, Co/Al

I got the products and they are fantastic. Worked perfect for my craft project and I would definitely buy them again