(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA
(949) 407-8904 Mon - Fri 08:00 - 17:00 23661 Birtcher Dr., Lake Forest, California, USA

ST0499 Nickel Iron Sputtering Target, Ni/Fe

Chemical Formula: Ni/Fe
Catalog Number: ST0499
Purity: 99%~99.999%
Shape: Discs, Plates, Column Targets, Step Targets, Custom-made

At SAM, we provide a range of Nickel Iron Sputter Targets in different forms, purities, sizes, and prices. Our expertise lies in producing high-purity physical vapor deposition materials, optimized for use in semiconductor, chemical vapor deposition, and physical vapor deposition applications in displays and optics. If you require further information or have specific inquiries, feel free to contact us.




Description

Nickel Iron Sputtering Target Description

NickelNickel is a chemical element originated from the shortened of the German ‘kupfernickel’ meaning either devil’s copper or St. Nicholas’s copper. It was first mentioned in 1751 and observed by F. Cronstedt. The isolation was later accomplished and announced by F. Cronstedt. “Ni” is the canonical chemical symbol of nickel. Its atomic number in the periodic table of elements is 28 with location at Period 4 and Group 10, belonging to the d-block. The relative atomic mass of nickel is 58.6934(2) Dalton, the number in the brackets indicating the uncertainty.

ironIron, also called ferrum, is a chemical element originated from the Anglo-Saxon name iren (ferrum in Latin). It was early used before 5000 BC. “Fe” is the canonical chemical symbol of iron. Its atomic number in the periodic table of elements is 26 with location at Period 4 and Group 8, belonging to the d-block. The relative atomic mass of iron is 55.845(2) Dalton, the number in the brackets indicating the uncertainty.

Related Products: Nickel Sputtering TargetIron Sputtering Target.

Nickel Iron Sputtering Target Specifications

Material Type Nickel Iron
Symbol Ni/Fe
Color/Appearance Solid
Melting Point /
Density /
Available Sizes Dia.: 2.0″, 3.0″, 4.0″, 5.0″, 6.0″
Thick: 0.125″, 0.250″

We also offer other customized shapes and sizes of the sputtering targets, please send us an inquiry for more information.

Nickel Iron Sputtering Target Application

Nickel Iron Sputtering Target is used for thin film deposition, decoration, semiconductor, display, LED and photovoltaic devices, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Packing

Our Nickel Iron Sputtering Targets are clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

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Nickel Iron Sputtering Target, Ni/Fe
Average rating:  
 1 reviews
by Karla R. on Nickel Iron Sputtering Target, Ni/Fe

The quality of these are great, and honestly I just adore the quality of SAM’s products.